高等学校化学学报 ›› 1993, Vol. 14 ›› Issue (11): 1565.

• 研究论文 • 上一篇    下一篇

3%NaCl溶液中铜缓蚀剂TTA的光电化学和表面电子能谱研究

杨迈之, 郭沁林, 蔡生民, 童汝亭, 郝彦忠, 任聚杰, 邸静, 周国定   

  1. 1. 北京大学化学系, 北京 100871;
    2. 河北师范大学化学系, 石家庄;
    3. 首都师范大学化学系, 北京;
    4. 上海电力学院动力工程系, 上海
  • 收稿日期:1992-12-10 修回日期:1993-06-19 出版日期:1993-11-24 发布日期:1993-11-24
  • 通讯作者: 杨迈之, 女, 37岁, 博士, 副教授.
  • 作者简介:杨迈之, 女, 37岁, 博士, 副教授.
  • 基金资助:

    国家自然科学基金;国家教育委员会优秀年轻教师基金

Studies on Photoelectrochemistry and Auger Electron Spectra for Inhibitor of Copper in 3% NaCl

YANG Mai-Zhi, GUO Qin-Lin, CAI Sheng-Min, TONG Ru-Ting, HAO Yan-Zhong, REN Ju-Jie, DI Jing, ZHOU Guo-Ding   

  1. 1. Department of Chemistry, Peking University, Beijing, 100871;
    2. Department of Chemistry, Hebei Normal University, Shijiazhuang;
    3. Department of Chemistry, Capital Normal University Beijing;
    4. Department of Thermal Power Engineering, Shanghai Institute of Electric Power, Shanghai
  • Received:1992-12-10 Revised:1993-06-19 Online:1993-11-24 Published:1993-11-24

摘要: 本文采用测开路光电压(VOPh)的方法,检测铜在3%NaCl溶液中的腐蚀行为及加入缓蚀剂TTA的缓蚀效果的浓度效应,并辅之以表面电子能谱进行研究.结果表明当TTA浓度小于1.5×10-5wt%时,反而加速Cl-侵蚀;当TTA浓度大于1.5×10-5wt%时,TTA才起到缓蚀作用.随TTA浓度继续增加,TTA保护膜变得更致密和更厚;当TTA浓度大于5×10-5wt%时,膜厚不再增加.

关键词: 铜, 缓蚀剂, 开路光电压

Abstract: Measuring the open circuit photovoltage, as a in-situ, non-destructive and sensible method, was used to investigate the corrosion of copper in the 3% NaCl solution and the inhibition efficiency of TTAwith different concentrations.Auger electron spectra (AES) technique was also used in this paper.The experiment result exhibits that TTAwill accelerate the corrosion of copper by Cl- when the concentration of TTAis smaller than 1, 5× 10-5 wt%, and that TTAcan inhibit the corrosion of copper by Cl- when the concentration of TTAis bigger than 1. 5× 10-5 wt%.With increasing the concentration of TTA, the TTAprotecting film will be denser and thicker.When TTAis more concentrative than5× 10-5 wt%, the thickness of the protecting film will not increase.

Key words: Copper, Inhibitor, Open circuit photovoltage

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