高等学校化学学报

高等学校化学学报 ›› 2005, Vol. 26 ›› Issue (9): 1777.

• 研究快报 • 上一篇    下一篇

相分离高分子共混薄膜退火和准淬火的原位原子力显微镜研究

廖永贵, 由吉春, 李学, 孙昭艳, 石彤非, 安立佳   

  1. 中国科学院长春应用化学研究所高分子物理与化学国家重点实验室, 长春130022
  • 收稿日期:2004-09-07 出版日期:2005-09-10 发布日期:2005-09-10
  • 基金资助:

    国家自然科学基金(批准号:20074037,50290090,20304015);国家重大基础研究前期研究专项(批准号:2002CCAD4000);国家杰出青年科学基金(批准号:59825113);国家自然科学基金重点项目(批准号:20334010)资助.

Annealing and Quasi-quenching Processes of Phase-Separated PMMA/SAN Thin Film Studied by in situ AFM with Hot Stage

LIAO Yong-Gui, YOU Ji-Chun, LI Xue, SUN Zhao-Yan, SHI Tong-Fei, AN Li-Jia   

  1. State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, China
  • Received:2004-09-07 Online:2005-09-10 Published:2005-09-10

PDF (PC)

被引次数

13

关键词: 高分子共混, 薄膜, 相分离, 退火, 淬火, 原位, 原子力显微镜

Abstract: The morphology and phase shift of phase-separated PMMA/SAN thin film on silicon wafer were studied by in situ AFM with hot stage through the annealing and quasi-quenching. The results show that the phase shifts are different between high temperature and room temperature, and between ultrahigh vacuum and ambient and between in situ and ex situ although the morphologies are almost invariable. The reasons were discussed simply.

Key words: Polymer blend, Thin film, Phase separation, Annealing, Quasi-quenching, In situ, AFM

中图分类号: 

TrendMD: