Photosensitive Ultra-thin Films of Chitosan and Sulfonate of Diazoresin

Abstract

Abstract: On the substrate of modified quartz, two kinds of self assembled ultra-thin films were fabricated through layer-by-layer electrostatic deposition with diazoresin′s sulfonate(DRS) as the polyanion, and chitosan(CS) as the polycation. The self assembly process was monitored by UV-Vis spectra and confirmed that the layer-by-layer deposition takes place regularly. The films obtained both from DRS, CS(CS/DRSfilm) and from DR, DRS, CS(DR/DRS/CS/DRSfilm) were photo sensitive. Under irradiation of ultraviolet light, the stability of the films towards polar solvents increases significantly. The kinetic study shows that the rate of the photodecomposition reaction of DR/DRS/CS/DRSfilms is higher than that of CS/DRSfilms and doesn't show the first order reaction for both films.

Key words: Chitosan, Sulfonate of diazoresin, Photosensitive ultra-thin film

CLC Number:

O629

TrendMD:

LU Cong-Hua, CAO Ting-Bing, LUO Chuan-Qiu, CAO Wei-Xiao  . Photosensitive Ultra-thin Films of Chitosan and Sulfonate of Diazoresin[J]. Chem. J. Chinese Universities, 2002, 23(1): 170.

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Photosensitive Ultra-thin Films of Chitosan and Sulfonate of Diazoresin

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