Growth and Gas Permeation Properties of SIFSIX-3-Ni Membrane †

doi:10.7503/cjcu20190085

Abstract

Abstract:

Using the macroporous glass-frit disk modified by (NH₄)₂SiF₆ as the substrate, we prepared the SIFSIX-3-Ni membrane by the in situ growth method under solvothermal conditions. The effect of temperature and concentration on the preparation of SIFSIX-3-Ni membrane were investigated in detail. X-Ray photoelectron spectroscopy(XPS) demonstrates that F atom was integrated into the substrate surface. The powder X-ray diffraction(PXRD) patterns were in accordance with the simulated one, indicating that we obtained SIFSIX-3-Ni membranes successfully. Scanning electron microscopy(SEM) showed that the SIFSIX-3-Ni-3 membrane was continuous and uniform with a thickness of about 20 μm. Thermogravimetric analysis(TGA) showed that there was no guest molecules in the membrane before activation. Single gas permeation measurement on SIFSIX-3-Ni-3 membrane demonstrated that the permeability of H₂, CO₂ and N₂ were 6.83×10 ^-6, 7.42×10 ^-7 and 8.89×10 ^-7 mol·m ^-2·s ^-1·Pa ^-1 respectively, and the ideal selectivities of H₂/CO₂ and H₂/N₂ were 9.20 and 7.68 respectively. The membrane can retain almost the same permeance of H₂, CO₂ and N₂ after 5 h of continuous testing, indicating that SIFSIX-3-Ni membrane have good stability.

Key words: SIFSIX-3-Ni membrane, In situ growth method, H₂ separation

CLC Number:

O614
O657

TrendMD:

MU Xin, JIANG Shuangshuang, ZHANG Shuhao, REN Hao, SUN Fuxing. Growth and Gas Permeation Properties of SIFSIX-3-Ni Membrane ^†[J]. Chem. J. Chinese Universities, 2019, 40(9): 1818.

Figures/Tables 8

Fig.1 PXRD patterns of the activated(a), as-synthesized(b) and simulated(c) SIFSIX-3-Ni(A) and adsorption isotherm of CO2 at 298 K for SIFSIX-3-Ni(B)

Fig.2 F1s XPS spectra of (NH4)2SiF6 powder(a), SIFSIX-3-Ni membrane(b), glass frit disk treated in(NH4)2SiF6 solution(c), glass frit disk treated in a solution of H2SO4 and H2O2(d) and raw glass-frit disk surface(e)(A) and enlarged pattern of glass frit disk treated in (NH4)2SiF6 solution(B)

Fig.3 PXRD patterns of SIFSIX-3-Ni membrane(A) and TG analysis of SIFSIX-3-Ni-3 membrane(B) (A) a. activated SIFSIX-3-Ni-3, b. SIFSIX-3-Ni-3, c. SIFSIX-3-Ni-2, d. SIFSIX-3-Ni-1, e. simulated; (B) a. activated, b. as-synthesized.

Fig.4 SEM images of SIFSIX-3-Ni-1(A), SIFSIX-3-Ni-2(B) and SIFSIX-3-Ni-3(C) membrane

Fig.5 Optical images of SIFSIX-3-Ni-2 membrane(A), SEM images of macroporous glass-frit disk(B), SIFSIX-3-Ni-2 membrane(C, D) and cross-section of the SIFSIX-3-Ni-2 membrane(E, F)

Fig.6 Optical image of SIFSIX-3-Ni-3 membrane(A), SEM images of macroporous glass-frit disk(B), SIFSIX-3-Ni-3 membrane(C, D) and cross-section of the SIFSIX-3-Ni-3 membrane(E, F)

Fig.7 H2, N2 and CO2 permeance as a function of molecular weight(A) and H2(c), N2(b) and CO2(a) permeance with time(B) on SIFSIX-3-Ni-3 membrane

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