关键词: 三嵌段共聚物, 薄膜, 形貌, Monte Carlo模拟, 退火, 淬火

Abstract: Self-assembly thin films of symmetric triblock copolymer after annealing and quenching were examined by an effective Monte Carlo simulation method. The defects in the ordered lamellae of the thin films after quenching,which were dependent on the initialization of copolymer melts,are removed in the thin films after annealing. The mean-square gyration radius and end-to-end distance of copolymer chains in the thin films after annealing are smaller than those in the thin films after quenching because of the complete relaxation of polymer during annealing. We also find that the density of A block in the region near to the surface is higher than that in the interior of the thin films. As a result,it is different from the thin films of symmetric A n B n diblock copolymer,in which surface ordering forms before the interior,that ordering phenomena occurs first in the interior region in the thin films of symmetric A n B m A n triblocl copolymer.

Key words: Triblock copolymer, Thin film, Morphology, Monte Carlo simulation, Anneal, Quench