高等学校化学学报 ›› 2004, Vol. 25 ›› Issue (1): 21.

• 研究简报 • 上一篇    下一篇

液相放电法合成氮化碳晶体

李超1,2, 曹传宝1, 朱鹤孙1, 吕强1, 张加涛1, 项顼1   

  1. 1. 北京理工大学材料科学研究中心, 北京 100081;
    2. 郑州轻工学院化学工程系, 郑州 450002
  • 收稿日期:2003-05-14 出版日期:2004-01-24 发布日期:2004-01-24
  • 通讯作者: 曹传宝(1964年出生),男,博士,教授,博士生导师,主要从事功能材料研究.E-mail:cbcao@bit.edu.cn E-mail:cbcao@bit.edu.cn
  • 基金资助:

    国家自然科学基金(批准号:20171007);教育部博士学科点研究基金(批准号:1999000718)资助

Crystalline Carbon Nitride Deposited by Glow Discharge in Liquid Phase

LI Chao1,2, CAO Chuan-Bao1, ZHU He-Sun1, Lü Qiang1, ZHANG Jia-Tao1, XIANG Xu1   

  1. 1. Research Center of Materials Science, Beijing Institute of Technology, Beijing 100081, China;
    2. Department of Chemical Engineering, Zhengzhou Institute of Light Industry, Zhengzhou 450002, China
  • Received:2003-05-14 Online:2004-01-24 Published:2004-01-24

关键词: 氮化碳, 薄膜, 电化学沉积, 针状镍电极

Abstract: A new electrodeposition system, with a thin nickel wire as the anode, was used to deposit the CN x thin film on Si(100) substrate from a dicyandiamide-saturated solution in acetonitrile at a high potential. During the experiment, when a certain high potential was applied, spark occurred between the Ni wire anode and the Si(100) substrate. The films were characterized by X-ray photoelectron spectroscopy(XPS), Fourier-transform infrared spectroscopy(FTIR), scaning electron microscopy(SEM) and X-ray diffraction(XRD). It was indicated that multiphase of α-C3N4, β-C3N4 and g-C3N4 was obtained in the films. This work is the first attempt to deposit carbon nitride material through a thin nickel wire anode and might provide a new route for preparing pure crystalline C3N4.

Key words: Carbon nitride, Thin film, Electrodeposition, Thin nickel wire anode

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