高等学校化学学报

高等学校化学学报 ›› 1994, Vol. 15 ›› Issue (4): 561.

• 论文 • 上一篇    下一篇

铁基体离子注入钯的腐蚀行为

吴仲达1, 王红森1, 林文廉2, 丁晓纪2   

  1. 1. 北京师范大学化学系, 北京, 100875;
    2. 北京师范大学低能核物理研究所
  • 收稿日期:1993-05-04 修回日期:1993-12-17 出版日期:1994-04-24 发布日期:1994-04-24
  • 通讯作者: 吴仲达,男,56岁,教授.
  • 作者简介:吴仲达,男,56岁,教授.
  • 基金资助:

    国家自然科学基金

Corrosion Behaviour of Palladium Implanted Iron Substrstrates

WU Zhong-Da1, WANG Hong-Sen1, LIN Wen-Lian2, DING Xiao-Ji2   

  1. 1. Department of Chemistry, Beijing Normal University, Beijing, 100875;
    2. Institute of Low Energy Nuclear Physics, Beijing Normal University, Beijing
  • Received:1993-05-04 Revised:1993-12-17 Online:1994-04-24 Published:1994-04-24

PDF (PC)

被引次数

5

摘要： 研究了铁基体离子注入钯后的腐蚀行为。钯离子注入剂量为1×1016～1×1018离子·cm-2,注入能量40keV.在pH=5.0的0.5mol/LNaAc/HAc缓冲溶液中,用动电位扫描法测量了注钯后的铁的阳极溶解过程,用开路腐蚀电位与浸泡时间的关系研究了修饰材料的耐蚀性。结果表明,钯离子的注入降低了铁的临界钝化电流,在pH=5.0的醋酸盐缓冲溶液中保持较好的钝性,但当注入电极表面的氧化膜被还原,注钯的铁的活化腐蚀速度高于未注入钯的铁。用AES和XPS分析了注入样品表面的组成和元素的价态。

关键词: 离子注入, 腐蚀, 钯, 铁

Abstract: The corrosion behavior of Pd+ -implanted iron substrates was investigated.Implantation of Pd+ was performed with doses between 1× 1016-1× 1018 ion·cm-2 at 40 keV.The anodic dissolution process of Pd+ -implanted iron was measured by means of potentiokinetic sweep in a 0.5 mol/L NaAc/HAc buffer solution with pH 5.0. The open circuit corrosion potential as a function of immersion time was used to evaluate the corrosion resistance of the modified materials.The results show that Pd+ -implantation decreases the critical pa sive current of iron and maintains a better passivity in the acetate buffer solution with pH 5.0 However, the active corrosion rate of Pd+ -implanted iron is higher than that of unimplanted iron when the oxide layer has been reduced.The composition and valency states of elements at the surface of the implanted samples were analyzed by AES and XPS.

Key words: Ion implantation, Corrosion, Palladium, Iron

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