Studies of Coating and Etching Process of JD Resin with XPS

Chem. J. Chinese Universities ›› 1995, Vol. 16 ›› Issue (1): 147.

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Studies of Coating and Etching Process of JD Resin with XPS

GAO Chang-You¹, ZHENG Da-Fang², YANG Bai¹, WEI Quan², SHEN Jia-Cong¹

1. Department of Chemistry, Jilin University, Changchun, 130023;
2. Test Centre, Jilin University, Changchun, 130023

Received:1994-01-25 Revised:1994-04-15 Online:1995-01-24 Published:1995-01-24

Abstract

Abstract: The etching process of JDresins studied with XPS shows that benzene rings accumulated on the surface more than in the body. The amount of groups such as C-OH,C=O,C-SO₃H and COOH introduced into the surface during etching increased with the increase of temperature or the prolonging of the time,and the content of every groups is calculated. The abrasion-resistance coating after being solidified has SiO₂structure. The priority etching condition for JD resins is at 20℃ kept for 20 min,so that the adhesion strength of the coating is increased while the light transmittance of the substrate is not decreased obviously.

Key words: XPS, Etching, Adhesion strength, Optical plastic, Coating

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GAO Chang-You, ZHENG Da-Fang, YANG Bai, WEI Quan, SHEN Jia-Cong. Studies of Coating and Etching Process of JD Resin with XPS[J]. Chem. J. Chinese Universities, 1995, 16(1): 147.

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Studies of Coating and Etching Process of JD Resin with XPS

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