高等学校化学学报

高等学校化学学报 ›› 2002, Vol. 23 ›› Issue (12): 2390.

• 研究快报 • 上一篇    下一篇

利用去湿现象制备图案化的离子刻蚀聚合物保护层

陆广1, 曹召良2, 卢振武2, 李伟1, 姚计敏1, 张刚1, 杨柏1, 沈家骢1   

  1. 1. 吉林大学超分子结构与材料教育部重点实验室, 化学学院, 长春130023;
    2. 中国科学院长春光学精密机械与物理研究所, 应用光学国家重点实验室, 长春130022
  • 收稿日期:2002-07-01 出版日期:2002-12-24 发布日期:2002-12-24
  • 通讯作者: 杨　柏(1962年出生),男,博士,教授,博士生导师,主要从事功能性及高性能聚合物光学材料研究.E-mail:yangbai@jlu.edu.cn E-mail:yangbai@jlu.edu.cn
  • 基金资助:

    国家自然科学基金(批准号:50073007);重大基础研究计划(批准号:G2000078102);国家教育部博士点基金资助

Fabrication of Patterned Polymer Resists for Ion Etching by Using Dewetting

LU Guang1, CAO Zhao-Liang2, LU Zhen-Wu2, LI Wei1, YAO Ji-Min1, ZHANG Gang1, YANG Bai1, SHEN Jia-Cong1   

  1. 1. Key Lab of Supramolecular Structure and Materials of Educational Ministry, College of Chemistry, Jilin University, Changchun 130023, China;
    2. State Key Lab of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130022, China
  • Received:2002-07-01 Online:2002-12-24 Published:2002-12-24

PDF (PC)

被引次数

11

关键词: 聚合物, 去湿, 微接触印刷, 自组装单层膜, 离子刻蚀

Abstract: A novel method using a combination of microcontact printing(μCP) technique, surface-directed condensation and surface- directed dewetting has been developed to fabricate patterned polymer films on gold substrates. These patterned polymer films can serve as resists in the argon ion etching effectively to transfer patterns into the underlying gold substrates. This method is flexible in controlling the shape and feature size of the patterns in the polymer resists by simply adjusting the concentration of polymer solution, and especially it also provides a route to sub-micrometer sized features by using an original template with micrometer sized features.

Key words: Polymer, Dewetting, Microcontact printing, Self-assembled monolayers, Ion etching

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