高等学校化学学报 ›› 2004, Vol. 25 ›› Issue (7): 1318.

• 研究论文 • 上一篇    下一篇

直流磁控溅射磁性γ′-Fe4N膜生长机理研究

徐娓1, 王欣2, 冯守华1, 郑伟涛2, 田宏伟2, 于陕升2, 杨开宇3   

  1. 1. 吉林大学化学学院, 无机合成与制备化学国家重点实验室;
    2. 吉林大学材料与工程学院;
    3. 吉林大学电子科学工程学院, 长春 130023
  • 收稿日期:2003-06-07 出版日期:2004-07-24 发布日期:2004-07-24
  • 通讯作者: 冯守华(1956年出生),男,博士,教授,博士生导师,从事材料化学合成等研究.E-mail:Shfeng@mail.jlu.edu.cn E-mail:Shfeng@mail.jlu.edu.cn
  • 基金资助:

    国家自然科学基金(批准号:20121103)资助

Growth Mechanism of Magnetic γ′-Fe4N Thin Films Deposited by D.C. Magnetron Sputtering

XU Wei1, WANG Xin2, FENG Shou-Hua1, ZHENG Wei-Tao2, TIAN Hong-Wei2, YU Shan-Sheng2, YANG Kai-Yu3   

  1. 1. State Key Laboratory of Inorganic Synthsis and Preparative Chemistry, College of Chemistry, Jilin University, Changchun 130023, China;
    2. College of Materials Science, Jilin University, Changchun 130023, China;
    3. College of Electronics Science and Engineering, Jilin University, Changchun 130023, China
  • Received:2003-06-07 Online:2004-07-24 Published:2004-07-24

摘要: 采用直流磁控溅射法研究了磁控溅射沉积氮化铁薄膜的生长机制,并归属了其生长普适类型.结果表明,磁控溅射法生长的薄膜表面具有自仿射分形特性,而且表面存在一定数量的空位或孔洞,粒子呈现悬臂沉积生长现象.γ′-Fe4N单相薄膜的生长指数β≈0.61±0.02,静态标度指数α≈0.57±0.20,各指数之间的关系为α+α/β≈2,薄膜生长属于KPZ普适类型.

关键词: &gamma, &prime, -Fe4N, 生长普适类型, 直流磁控溅射, 磁性

Abstract: A variety of natural and industrial dynamical processes, such as vapor deposition, spray painting, and chemical dissolution, lead to the formation of rough surfaces. In the light of dynamical scaling, the growth and formation of such rough interfaces can be researched. In this paper, we deposited Fe-N thin films on glass substrates at different temperatures and different time by DC magnetron sputtering in N 2/Ar atmosphere. The composition, structure and saturation magnetization of the films were investigated. The growth of the γ′-Fe4N phase was also analyzed by using dynamic scaling. It is found that the surfaces of the Fe-N films typically exhibits self-affine structures both in space and time, and the 2-dependent nontrivial exponents are α≈0.57±0.20 and β≈0.61±0.02, respectively. The scaling relationship α+α/β≈2 is obeyed, which is in agreement with KPZ universality. The growth process allowed the formation of overhangs or voids, and desorption was the dominant relaxation process.

Key words: γ′-Fe4N, Growth universality class, D.C. magnetro sputtering, Magnetism

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