Abstract: Low energy ions were produced by N₂ glow-discharge. The positive ones were accelerated into ethanol solution with D₂O as solvent to induce chemical reactions. GC-MSanalysis showed that DCH₂CH₂OH, HOCH₂CH₂OD were produced by such kind of implantation. Thus, it was proved that the reaction was mainly caused by radicals generated by decomposition of water molecules, D^· and ^·OD played an important role in the process. Meanwhile, CH₃COOD and HOCH₂CH₂ND₂ were also found in the products, so it was concluded that the reaction was carried out under an oxidative atmosphere, which was thought to be probably related to ^·OD radicals, too. The capture of Dfrom D₂O by N⁺ to form ^·ND₂ radicals was not only an initial step to produce HOCH₂CH₂ND₂ but also served as a probable pattern for "nitrogen deposition". All these are helpful to reveal the mechanism of the reaction induced by low energy N⁺ implanting into solution samples.

Key words: Low energy ion, Ethanol, Aqueous solution, GC-MS