Chem. J. Chinese Universities ›› 1996, Vol. 17 ›› Issue (4): 626.

• Articles • Previous Articles     Next Articles

Laser-Induced Selective Deposition of Nickel on p-Type Silicon

WANG Jian1, YU Zu-Zhan1, YU Ning2   

  1. 1. Department of Chemistry, Fudan University, Shanghai 200433;
    2. Department of Chemistry, Tongji University, Shsnghai
  • Received:1995-04-24 Online:1996-04-24 Published:1996-04-24

Abstract: Selective deposition of thin nickel films on p-type silicon was obtained in a hy drazine-based conventional electroless nickel plating solution at the ambient temperature under laser irradiation.Composition and properties of the deposits were investigated using SEM,AESand RBStechniques.The deposits are in Schottky barrier contact with p-type silicon.The mechanism involved in the deposition process was also discussed.

Key words: Laser-inducing, Chemical deposition, Nickel

TrendMD: