Preparation of Photo-responsive Film by Electrochemical Deposition Method and the Application in Optical Information Storage†

doi:10.7503/cjcu20180533

Abstract

Abstract:

In order to improve the stability of photo-isomerization patterning of photo-responsive film based on azobenzene moiety, a new photo-responsive material based on azobenzene moiety with high electrochemical activity was designed and synthesized, named 1,2-bis(4-{[6-(9H-carbazol-9-yl)hexyl]oxy}phenyl)diazene(BHCzAzo) which exhibited a good photo-isomerization ability between trans-configuration and cis-configuration. BHCzAzo was prepared into a highly crosslinked polymer film without any crack or peeling on the surface using electrochemical deposition(ED) method due to the electrochemical activity of carbazole moiety in BHCzAzo. And the stability of the prepared film was enhanced in the result of the compact stacking mode of ED film. The film was irradiated with 355 nm interfering laser beam, and then a periodic pattern of photo-induced surface relief gratings was formed with good morphological surface. The photo-induced pattern was proved to possess high stability using the experiments of being immersed in different common solvent and heated at different temperature. The stability of photo-induced pattern was greatly enhanced by preparing cross-linked film with photo-responsive ability using ED method.

Key words: Azobenzene, Photo-responsive material, Electrochemical deposition, Photo-induced surface patterning

CLC Number:

O631.5

TrendMD:

ZHAO Ruiyang,YU Chunyan,HAN Jishu,FU Yunlei,LI Ming,HU Dehua,LIU Fusheng. Preparation of Photo-responsive Film by Electrochemical Deposition Method and the Application in Optical Information Storage^†[J]. Chem. J. Chinese Universities, 2019, 40(2): 358.

Figures/Tables 10

Scheme 1 Synthesis routes of electrochemical deposition(ED) precursor BHCzAzo

Fig.1 TGA(A) and DSC(B) curves of BHCzAzo recorded at a heating rate of 10 K/min

Fig.2 UV-Vis spectra of BHCzAzo solution irradiated by light in different time(A) Irradiated by 355 nm light. Time/s: a. 0; b. 1; c. 2; d. 5; e. 10. (B) Irradiated time by natural light. a. PSS; b. 1 min; c. 10 min; d. 20 min; e. 40 min; f. 120 min.

Fig.3 Multiple cycles of cis-trans isomerization of BHCzAzo THF solution under 355 nm UV light and natural light

Fig.4 CV curves of BHCzAzo in ED process with 40 cycles

Fig.5 SEM(A) and AFM(B) images of BHCzAzo ED film

Fig.6 FTIR spectra of BHCzAzo powder(a) and ED film(b)

Fig.7 N1s XPS spectra of BHCzAzo spin coated film(a) and ED film(b)

Fig.8 SEM(A) and AFM(B) images of BHCzAzo ED film after being irradiated by 355 nm interfering laser beam for 5 s(C, D) AFM images of erased photo-induced pattern after being irradiated by 480 nm laser beam for 5 min(C) and 10 min(D).

Fig.9 SEM images of photo-induced SRG patterns with different handling methods(A) CH2Cl2(DMF, THF, toluene), 30 min; (B) H2O(pH=3—10), 30 min; (C) 30—80 ℃, 30 min; (D) 90 ℃, 30 min.

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