碳布功能化处理及纳米二氧化锰的电化学沉积

doi:10.7503/cjcu20180111

摘要/Abstract

摘要：

利用适当电位范围内的循环伏安扫描对碳布(CC)进行功能化处理, 制备部分还原功能化碳布(RFCC). 以RFCC为电极基底, 进行纳米MnO₂的电化学沉积. 研究了溶液组成对MnO₂电化学沉积的影响, 并在含(NH₄)₂SO₄溶液中制备了N-MnO₂/RFCC. 研究结果表明, 适当的功能化处理可显著改善碳布的亲水性, 引入的含氧官能团有助于均匀锚定Mn²⁺, 诱导纳米MnO₂均匀生长. 电化学沉积体系中加入(NH₄)₂SO₄有助于增大MnO₂电极材料的比表面积, 提高储能性能.

关键词: 碳布功能化, 二氧化锰, 电化学沉积, 超级电容器

Abstract:

Carbon cloth(CC) was treated by cyclic voltammetry in designed potential range to afford partially reduced functionalized carbon cloth(RFCC). Electrochemical deposition of nanostructured MnO₂ was conducted on RFCC. The influence of electrodeposition solution on MnO₂ deposition was investigated and N-MnO₂/RFCC was prepared in the solution containing (NH₄)₂SO₄. The results show that the functionalization of CC is helpful to improve its wettability, while the introduced oxygen containing functional groups can facilitate the uniform distribution of Mn²⁺ in the deposition solution to promote the uniform growth of MnO₂ nanoparticles. The adding of (NH₄)₂SO₄ is helpful to increase the specific surface area of MnO₂, leading to improved charge storage behaviors.

Key words: Functionalization of carbon cloth, Manganese dioxide, Electrochemical deposition, Supercapacitor

中图分类号:

O646

TrendMD:

冯东阳, 郭迪, 刘晓霞. 碳布功能化处理及纳米二氧化锰的电化学沉积. 高等学校化学学报, 2018, 39(10): 2280.

FENG Dongyang,GUO Di,LIU Xiaoxia. Functionalization of Carbon Electrode and Subsequent Electrochemical Deposition of Nanostructured Manganese Oxide^†. Chem. J. Chinese Universities, 2018, 39(10): 2280.

图/表 8

Fig.1 CV profiles of CC in 2 mol/L H2SO4 aqueous solution(A), FCC at a scan rate of 20 mV/s(B) RFCC at a scan rate of 20 mV/s(C) and integral areas of CV profiles in (C) vs. lower potential limit during electrochemical functionalization of CC to afford RFCC(D)

Fig.2 C1s XPS core level spectra of CC, FCC, RFCC and dRFCC(A) and fitted C1s XPS spectrs of FCC(B), RFCC(C) and dRFCC(D)

Fig.3 Nitrogen adsorption-desorption isotherms of CC, FCC, RFCC and dRFCC

Fig.4 SEM images of CC(A), FCC(B) and RFCC(C) with contact angles in the insets and CV profiles of CC, FCC and RFCC at a scan rate of 20 mV/s(D)

Fig.5 XRD patterns of MnO2/CC(a), N-MnO2/CC(b), MnO2/RFCC(c) and N-MnO2/RFCC(d)

Fig.6 SEM images of MnO2/CC(A), N-MnO2/CC(B), MnO2/RFCC(C) and N-MnO2/RFCC(D)

Fig.7 Electrochemical performances of MnO2/CC(a), N-MnO2/CC(b), MnO2/RFCC(c) and N-MnO2/RFCC(d) in 0.5 mol/L Na2SO4 aqueous solution (A) CV profiles at a scan rate of 20 mV/s; (B) galvanostatic charge/discharge profiles at a current density of 1 A/g; (C) specific capacitance at various current densities(1—20 A/g); (D) cycling stability at a current density of 8 A/g for 1000 cycles.

Fig.8 Galvanostatic charge/discharge profiles of MnO2/CC(A), N-MnO2/CC(B), MnO2/RFCC(C) and N-MnO2/RFCC(D) at different current densities(1—20 A/g)

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