高等学校化学学报

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单色化X射线对薄膜表面高分子降解行为的影响

由吉春1, 李兴林2, 石彤非1, 苏朝晖1, 安立佳1   

    1. 中国科学院长春应用化学研究所, 高分子物理与化学国家重点实验室,
    2. 国家电化学和光谱研究分析中心, 长春 130022
  • 收稿日期:2008-03-20 修回日期:1900-01-01 出版日期:2008-07-10 发布日期:2008-07-10
  • 通讯作者: 石彤非,苏朝晖

Investigation of Degradation Behavior of Polymer on Surface of Film Due to the Existence of Monochromatic X-ray

YOU Ji-Chun1, LI Xin-Lin2, SHI Tong-Fei1*, SU Zhao-Hui1*, AN Li-Jia1   

    1. State Key Laboratory of Polymer Physics and Chemistry,
    2. National Analytical Research Center of Electrochemistry and Spectroscopy, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, China
  • Received:2008-03-20 Revised:1900-01-01 Online:2008-07-10 Published:2008-07-10
  • Contact: SHI Tong-Fei,SU Zhao-Hui

摘要: 采用聚甲基丙烯酸甲酯(PMMA)和苯乙烯-丙烯腈无规共聚物(SAN)薄膜体系, 在不同的实验温度下, 研究了单色化的X射线对其中一个组分(PMMA)降解行为的影响.

关键词: 单色化X射线, 降解, X射线光电子能谱, 薄膜表面

Abstract: Degradation and its temperature dependence of poly(methyl methacrylate)(PMMA) in the blend film of PMMA/SAN were investigated via in-situ X-ray photoelectron spectroscopy(XPS). The results show that thermal degradation of PMMA takes place at 185, 130, 80 ℃ and even room temperature due to the existence of monochromatic X-ray. Furthermore, the degradation rate depends crucially on the experiment temperature.

Key words: Monochromatic X-ray, Degradation, X-ray photoelectron spectroscopy, Surface of film

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