高等学校化学学报 ›› 2005, Vol. 26 ›› Issue (3): 511.

• 研究论文 • 上一篇    下一篇

衬底温度对全氟取代酞菁锌固体薄膜微结构的影响

陈顺国, 孙景志, 黄骥, 汪茫   

  1. 浙江大学高分子科学与工程学系, 浙江大学硅材料国家重点实验室 杭州 310027
  • 收稿日期:2004-04-06 出版日期:2005-03-10 发布日期:2005-03-10
  • 通讯作者: 孙景志(1964年出生),男,博士,副教授,主要从事有机光电功能材料的合成与性能研究.E-mail:sunjz@zju.edu.cn E-mail:sunjz@zju.edu.cn
  • 基金资助:

    国家自然科学基金(批准号:90101008);国家“九七三”计划项目(批准号:2002CB613401)资助.

Effect of Substrate Temperature on Micro-structural Features of Zinc Perfluorophthalocyanine Thin Films

CHEN Shun-Guo, SUN Jing-Zhi, HUANG Ji, WANG Mang   

  1. State Key Lab of Silicon Materials, Department of Polymer Science & Engineering, Zhejiang University, Hangzhou 310027, China
  • Received:2004-04-06 Online:2005-03-10 Published:2005-03-10

摘要: 用UV-Vis光谱、X射线衍射(XRD)和原子力显微镜(AFM)对全氟取代酞菁锌(F16PcZn)在不同温度下的石英衬底上的分子堆砌方式进行了研究,F16PcZn分子沉积按3个阶段进行.首先通过F-原子与石英衬底的强相互作用形成“card-packing”奠基层,进而形成“amorphousaccumulation”过渡层,最后形成有序的“brick-stacking”结晶层.三种分子堆砌方式对应的吸收光谱谱峰分别出现在640,670和810nm附近.810nm附近吸收峰形状的变化说明衬底温度升高有利于“brick-stacking”堆砌方式的实现,AFM观察的结果证实衬底温度升高使结晶微畴增大.常温下结晶层中分子以单斜点阵平行排列,点阵常数a为1.494nm,在250~300℃下分子发生位型微调,F16PcZn分子采取更致密的堆积方式(a=1.428nm).

关键词: 分子堆砌, 表面形貌, 薄膜

Abstract: Molecular stacking in zinc perfluorophthalocyanine(F16PcZn) thin films deposited on quartz wafer at different temperatures was systematically investigated. UV-Vis absorption spectra, X-ray diffraction(XRD) patterns and atomic force microscopic(AFM) images reveal a three-step growing mechanism ranging from room temperature to 300 ℃. Firstly, a “card-packing” ground layer forms by the strong interactions between F atoms on F16PcZn molecules and quartz substrate. Secondly, an “amorphous accumulation” transition layer grows on the top of the ground layer. Finally, a highly ordered “brick-stacking” crystalline layer is built up. The corresponding absorption features of these three stacking modes was shown at around 640, 670 and 810 nm respectively. The temperature-dependent variation of the feature at 810 nm indicates that the “brick-stacking” is a favorable mode at the elevated temperature. AFM images show that the F16PcZn crystalline domain sizes increase with raising temperature. XRD data demonstrate that, at atmosphere temperature, the F16PcZn molecules arrange in a monoclinic lattice with a constant of a=1.494 nm, while from 250 ℃ to 300 ℃, the molecular stacking evolves to a more compact mode with a little shorter constant of a=1.428 nm.

Key words: Molecular stacking, Surface morphology, Thin film

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