高等学校化学学报 ›› 2004, Vol. 25 ›› Issue (9): 1689.

• 研究论文 • 上一篇    下一篇

柔红霉素在钴离子注入修饰玻碳电极上与DNA相互作用

王静, 胡劲波, 尚军, 李启隆   

  1. 北京师范大学化学系, 北京100875
  • 收稿日期:2003-11-18 出版日期:2004-09-24 发布日期:2004-09-24
  • 基金资助:

    国家自然科学基金(批准号:20275007)资助

Interaction Between Daunorubicin and DNA at Co Ion Implanted Modified Glass Carbon Electrode

WANG Jing, HU Jin-Bo, SHANG Jun, LI Qi-Long   

  1. Department of Chemistry, Beijing Normal University, Beijing 100875, China
  • Received:2003-11-18 Online:2004-09-24 Published:2004-09-24

摘要: 用钴离子注入修饰电极研究了柔红霉素与DNA的相互作用.柔红霉素以嵌入方式与DNA发生作用,形成非电活性的结合物.加入DNA后,柔红霉素的电化学行为没有改变,仍为扩散控制.用非线性拟合得到柔红霉素与DNA的结合常数K=1.09×108cm3/mol,结合数s≈4.DNA分子结构中的1个螺旋结合2个柔红霉素.

关键词: 柔红霉素, DNA, 离子注入, 修饰电极, 电化学方法

Abstract: With Co/GCE as the working electrode, an interaction between daunorubicin and DNA was studied. The peak current of daunorubicin decreased with increasing the concentration of DNA and then disappeared, which indicated that an unelectroactive complex of DNR with DNA was formed. The UV-Vis spectrum showed that the daunorubicin intercalated into DNA. In the presence of DNA, the electrochemical behavior of DNR was unchanged. The binding constant and binding-site size of DNR-DNA interaction were obtained by nonlinear regression analysis, to be 1.09×108cm3/mol and 4, respectively. One helix in the DNA structure combined two DNR.

Key words: Daunorubicin, DNA, Ion implantation, Modified electrode, Electrochemical method

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