Fabrication of Three-dimensional Microstructure by Argon Ion Laser Curing of Epoxy Resin

Abstract

Abstract: Visible light curable photoresist consisting of epoxy resin Epon SU8 and iron arene photo initiator Irgacure 261 was used to fabricate three-dimensional microstructure by means of three-dimensional holographic lithography technique. Argon ion laser with wavelength of 488 nm was used as light source in the experiments. Field emission microscope diagram showed the formation of three-dimensional microstructure. It was found that the amount of photo-initiator, the laser intensity and the exposure time are the key factors to obtain well defined three-dimensional microstructure.

Key words: Argon ion laser, Holographic lithography technique, Photoresist, Microstructure

CLC Number:

O631

TrendMD:

ZENG Zhao-Hua, WANG Xia, YANG Jian-Wen, WANG He-Zhou, CHEN Yong-Lie . Fabrication of Three-dimensional Microstructure by Argon Ion Laser Curing of Epoxy Resin[J]. Chem. J. Chinese Universities, 2002, 23(6): 1205.

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Fabrication of Three-dimensional Microstructure by Argon Ion Laser Curing of Epoxy Resin

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