Thermodynamic Analysis for Chemical Vapor Deposition Diamond with the Participation of Chlorine

Chem. J. Chinese Universities ›› 1999, Vol. 20 ›› Issue (1): 111.

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Thermodynamic Analysis for Chemical Vapor Deposition Diamond with the Participation of Chlorine

LIU Zhi-Jie¹, ZHANG Wei¹, ZHANG Jian-Yun¹, WAN Yong-Zhong¹, WANG Ji-Tao¹, CAO Chuan-Bao², ZHU He-Sun²

1. Department of Electronic Engineering, CVD Laboratory, Fudan University, Shanghai, 200433;
2. Material Science Laboratory, Beijing University of Science and Technology, Beijing, 100081

Received:1998-01-15 Online:1999-01-24 Published:1999-01-24

Abstract

Abstract: Diamond growth condition for C₂H₂Cl system is studied by using The non-equilibrium Thermodynamic coupling model.The pHase diagram for diamond growt h is calculated, which is in good agreement with many reported experiments.The experimental observation that diamond film may grow at a higher rate under low temperature and have better qualities due to The addition of chlorine is also discussed according to The Thermodynamic analysis.

Key words: Chlorine, Diamond, Chemical vapor deposition, Thermodynamics

CLC Number:

O642

TrendMD:

LIU Zhi-Jie, ZHANG Wei, ZHANG Jian-Yun, WAN Yong-Zhong, WANG Ji-Tao, CAO Chuan-Bao, ZHU He-Sun . Thermodynamic Analysis for Chemical Vapor Deposition Diamond with the Participation of Chlorine[J]. Chem. J. Chinese Universities, 1999, 20(1): 111.

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Thermodynamic Analysis for Chemical Vapor Deposition Diamond with the Participation of Chlorine

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