Chem. J. Chinese Universities ›› 2019, Vol. 40 ›› Issue (9): 1979.doi: 10.7503/cjcu20190047

• Physical Chemistry • Previous Articles     Next Articles

Preparation of UIO-66-based Porous Nano-octahedral FeP@PC for Efficient and Durable Hydrogen Evolution

WANG Wenfeng1,QIN Shan1,ZHANG Rongrong1,ZHOU Panpan1,YANG Qinghua2,*(),CHEN Tianyun1,*()   

  1. 1. School of Chemistry and Chemical Engineering
    2. School of Food and Biological Engineering, Hefei University of Technology, Hefei 230000, China
  • Received:2019-01-16 Online:2019-09-10 Published:2019-05-24
  • Contact: YANG Qinghua,CHEN Tianyun E-mail:yqhsina@126.com;t-y99@163.com
  • Supported by:
    ? Supported by the Natural Science Foundation of Anhui Province, China(1808085ME143)

Abstract:

By using UIO-66 as the precursor, porous FeP@PC was prepared by chemical vapor deposition of FeCl3, in-situ carbonization, phosphating and HF etching. The morphology, crystal structure, elemental composition and valence states of FeP@PC were characterized by field emission transmission electron microscopy(FETEM), X-ray diffraction(XRD), X-ray photoelectron spectroscopy(XPS) and N2 adsoption-desorption measurements. The results showed that FeP@PC maintained the original porous nano-octahedral structure of UIO-66 and had a high specific surface area of 83 m 2/g. For linear sweep voltammetry and electrochemical impedance spectroscopy measurements, the catalyst FeP@PC only needed overpotential of 156 mV to driven current density of 10 mA/cm 2. Meanwhile, the Tafel slope, the electron-transfer resistance and the electrochemically active surface area of the catalyst were calculated to be 84 mV/dec, 44 Ω and 13.9 mF/cm 2, respectively. In order to evaluate the durability and stability of the catalyst, 12 h-chronoamperometry and 1000-cycle cyclic voltammetry measurements were also conducted and no obvious activity decay was observed.

Key words: Iron phosphide, Metal-organic framework, Chemical vapor deposition(CVD), In situ phosphating, Hydrogen evolution reaction

CLC Number: 

TrendMD: