Studies on Photoelectrochemistry and Auger Electron Spectra for Inhibitor of Copper in 3% NaCl

Chem. J. Chinese Universities ›› 1993, Vol. 14 ›› Issue (11): 1565.

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Studies on Photoelectrochemistry and Auger Electron Spectra for Inhibitor of Copper in 3% NaCl

YANG Mai-Zhi, GUO Qin-Lin, CAI Sheng-Min, TONG Ru-Ting, HAO Yan-Zhong, REN Ju-Jie, DI Jing, ZHOU Guo-Ding

1. Department of Chemistry, Peking University, Beijing, 100871;
2. Department of Chemistry, Hebei Normal University, Shijiazhuang;
3. Department of Chemistry, Capital Normal University Beijing;
4. Department of Thermal Power Engineering, Shanghai Institute of Electric Power, Shanghai

Received:1992-12-10 Revised:1993-06-19 Online:1993-11-24 Published:1993-11-24

Abstract

Abstract: Measuring the open circuit photovoltage, as a in-situ, non-destructive and sensible method, was used to investigate the corrosion of copper in the 3% NaCl solution and the inhibition efficiency of TTAwith different concentrations.Auger electron spectra (AES) technique was also used in this paper.The experiment result exhibits that TTAwill accelerate the corrosion of copper by Cl- when the concentration of TTAis smaller than 1, 5× 10^-5 wt%, and that TTAcan inhibit the corrosion of copper by Cl^- when the concentration of TTAis bigger than 1. 5× 10^-5 wt%.With increasing the concentration of TTA, the TTAprotecting film will be denser and thicker.When TTAis more concentrative than₅× 10^-5 wt%, the thickness of the protecting film will not increase.

Key words: Copper, Inhibitor, Open circuit photovoltage

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YANG Mai-Zhi, GUO Qin-Lin, CAI Sheng-Min, TONG Ru-Ting, HAO Yan-Zhong, REN Ju-Jie, DI Jing, ZHOU Guo-Ding. Studies on Photoelectrochemistry and Auger Electron Spectra for Inhibitor of Copper in 3% NaCl[J]. Chem. J. Chinese Universities, 1993, 14(11): 1565.

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Studies on Photoelectrochemistry and Auger Electron Spectra for Inhibitor of Copper in 3% NaCl

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