高等学校化学学报

高等学校化学学报 ›› 1993, Vol. 14 ›› Issue (10): 1451.

• 研究简报 • 上一篇    下一篇

气相沉积法制Rh-Ti/SiO2催化剂的研究

胡云行, 万惠霖   

  1. 厦门大学化学系, 固体表面物理化学国家重点实验室, 厦门 361005
  • 收稿日期:1992-12-11 修回日期:1993-04-05 出版日期:1993-10-24 发布日期:1993-10-24
  • 通讯作者: 胡云行, 男, 31岁, 博士, 副教授.
  • 作者简介:胡云行, 男, 31岁, 博士, 副教授.
  • 基金资助:

    国家自然科学基金;福建省科学基金

Studies on the Rh-Ti/SiO2 Catalysts Prepared by Vapor Deposition Method

HU Yun-Hang, WAN Hui-Lin   

  1. Chem.Dept., National Lab.for Phys.Chem.of Solid Surface, Xiamen Univ., Xiamen, 361005
  • Received:1992-12-11 Revised:1993-04-05 Online:1993-10-24 Published:1993-10-24

PDF (PC)

关键词: 气相沉积, Rh/SiO2, Ti助剂

Abstract: Aseries of Rh-Ti/SiO2 catalysts were prepared by vapor deposition method.The catalysts were characterized by XPS, TPDand their activities of COhydrogenation were tested in a microreactor system.The results show that the Ti content of the catalysts has approximately linear relations with the deposition time of TiCl4.Although Ti covers some of the active sites on the catalysts surface, it enhances the activity of each active site and the total activities.

Key words: Vapor deposition, Rh/SiO2, Titanium promoter

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