高等学校化学学报 ›› 1994, Vol. 15 ›› Issue (11): 1702.

• 研究快报 • 上一篇    下一篇

原子力显微镜研究APS化单晶硅衬底及单层MD膜表面

张希, 高芒来, 王力彦, 沈家骢   

  1. 吉林大学化学系, 长春, 130023
  • 收稿日期:1994-07-05 修回日期:1994-09-03 出版日期:1994-11-24 发布日期:1994-11-24
  • 通讯作者: 张希,男,29岁,博士,讲师.
  • 作者简介:张希,男,29岁,博士,讲师.
  • 基金资助:

    国家教育委员会归国人员科研启动基金;吉林省科委青年基金

Surface Structures of APS Cationized Si Substrate and Monolayered Polymer Molecular Deposition Film Observed by Atomic Force Microscopy

ZHANG Xi, GAO Mang-Lai, WANG Li-Yan, SHEN Jia-Cong   

  1. Department of Chemistry, Jilin University, Changchun, 130023
  • Received:1994-07-05 Revised:1994-09-03 Online:1994-11-24 Published:1994-11-24

关键词: 原子力显微镜, APS修饰表面, 分子沉积膜

Abstract: The surface structure of aminopropyhlanized(APS)cationized Si substrate and monolayered polymer molecular deposition(MD) film were investigated with atomic force microscopy(AFM).AFMimages of the APS Si substrate showed a close packed and well-ordered arrangement, in which the periodical spacings are 0.359 nm and 0.562 nm in two directions, respectively.As shown in the AFMimage of polymer MDfilm, the surface fluctuation is in the range of nanometer scale and its image has no change after scanning 50-100times, thus it is demonstrated that MDfilm is of higher stablity than that of LBfilms.

Key words: AFM, APS modified surface, Molecular deposition film

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