Chem. J. Chinese Universities ›› 1994, Vol. 15 ›› Issue (4): 561.

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Corrosion Behaviour of Palladium Implanted Iron Substrstrates

WU Zhong-Da1, WANG Hong-Sen1, LIN Wen-Lian2, DING Xiao-Ji2   

  1. 1. Department of Chemistry, Beijing Normal University, Beijing, 100875;
    2. Institute of Low Energy Nuclear Physics, Beijing Normal University, Beijing
  • Received:1993-05-04 Revised:1993-12-17 Online:1994-04-24 Published:1994-04-24

Abstract: The corrosion behavior of Pd+ -implanted iron substrates was investigated.Implantation of Pd+ was performed with doses between 1× 1016-1× 1018 ion·cm-2 at 40 keV.The anodic dissolution process of Pd+ -implanted iron was measured by means of potentiokinetic sweep in a 0.5 mol/L NaAc/HAc buffer solution with pH 5.0. The open circuit corrosion potential as a function of immersion time was used to evaluate the corrosion resistance of the modified materials.The results show that Pd+ -implantation decreases the critical pa sive current of iron and maintains a better passivity in the acetate buffer solution with pH 5.0 However, the active corrosion rate of Pd+ -implanted iron is higher than that of unimplanted iron when the oxide layer has been reduced.The composition and valency states of elements at the surface of the implanted samples were analyzed by AES and XPS.

Key words: Ion implantation, Corrosion, Palladium, Iron

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