Structure and Electrochemical Performance of Copper Doped Vanadium Oxide Thin Films Deposited by RF Magnetron Sputtering

Abstract

Abstract:

V₂O₅ was used as cathode material for all solid state thin film lithium-ion batteries, so as to improve electrochemical properties of V₂O₅ thin film material. In this paper, copper doped and undoped vanadium oxide films were deposited on silicon substrates by RF magnetron sputtering. The films were characterized by XRD, SEM and XPS. The results show that undoped thin films are polycrystalline-V₂O₅ and copper doped thin films are amorphous copper-vanadium oxide. The Cu ions are at +2 oxidation state, while the V ions are mixed with +4 and +5 oxidation state. With increasing the concentration of doped Cu, the ratio of V⁴⁺/V⁵⁺ increases. The electrochemical tests show that doping copper contribute to increase the capacity of V₂O₅ films. The film with a composition of Cu_2.1VO_4.4 indicate highest capacity among all samples and is observed better cycleability, which is 83.4 μA·h·cm^-2·μm^-1 up to 100 cycles.

Key words: Copper-vanadium oxide, RF magnetron sputtering, Cathode material, Electrochemical property

TrendMD:

ZHANG Liang-Tang, SONG Jie, CAI Min-Zhen, XU Fu-Chun, WU Sun-Tao*, ....... Structure and Electrochemical Performance of Copper Doped Vanadium Oxide Thin Films Deposited by RF Magnetron Sputtering[J]. Chem. J. Chinese Universities, 2009, 30(5): 971.

References

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