Growth Behavior of Amorphous Fe—N Thin Films Applicability of Conventional Dynamic Scaling Approach

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Growth Behavior of Amorphous Fe—N Thin Films Applicability of Conventional Dynamic Scaling Approach

XU Wei¹, WANG Xin²*, JIA Hui³, ZHENG Wei-Tao², LONG Bei-Hong²

1. State Key Laboratory of Inorganic Synthesis and Preparative Chemistry, College of Chemistry,
2. Key laboratory of Automobile Materials of MOE, Collgeg of Materials Science and Engineering, Jilin University, Changchun 130012, China;
3. School of Physics, Beihua University, Jilin 132021, China

Received:2007-04-26 Revised:1900-01-01 Online:2007-11-10 Published:2007-11-10
Contact: WANG Xin

Abstract

Abstract: Dynamic scaling approach is an effective tool for studying the growth behavior of roughness surfaces. The growth behavior of amorphous Fe—N thin films grown by dc magnetron sputtering at 250 ℃ substrate temperature was investigated. The surface morphology of the films appeared as a set of continuous mounds and exhibited scale-invariant self-affine fractal. The measured dynamic scaling components(α=0.82±0.21, β=0.44±0.07, and 1/z=0.54±0.07) are consistent with the conventional dynamic scaling relationship z=α/β. The intermediate value of growth exponent β agrees well with the thermal reemission model suggested by Karabacak et al. It might be concluded that both reemission of atoms and surface diffusion are the surface smoothing effects for the shadowing growth of amorphous Fe—N films at high substrate temperatures.

Key words: Amorphous iron nitride thin films, Dynamic scaling approach, Thermal reemissions model

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XU Wei¹, WANG Xin²*, JIA Hui³, ZHENG Wei-Tao², LONG Bei-Hong². Growth Behavior of Amorphous Fe—N Thin Films Applicability of Conventional Dynamic Scaling Approach[J]. Chem. J. Chinese Universities, doi: .

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Growth Behavior of Amorphous Fe—N Thin Films Applicability of Conventional Dynamic Scaling Approach

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