Fabrication of Patterned Polymer Resists for Ion Etching by Using Dewetting

Chem. J. Chinese Universities ›› 2002, Vol. 23 ›› Issue (12): 2390.

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Fabrication of Patterned Polymer Resists for Ion Etching by Using Dewetting

LU Guang¹, CAO Zhao-Liang², LU Zhen-Wu², LI Wei¹, YAO Ji-Min¹, ZHANG Gang¹, YANG Bai¹, SHEN Jia-Cong¹

1. Key Lab of Supramolecular Structure and Materials of Educational Ministry, College of Chemistry, Jilin University, Changchun 130023, China;
2. State Key Lab of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130022, China

Received:2002-07-01 Online:2002-12-24 Published:2002-12-24

Abstract

Abstract: A novel method using a combination of microcontact printing(μCP) technique, surface-directed condensation and surface- directed dewetting has been developed to fabricate patterned polymer films on gold substrates. These patterned polymer films can serve as resists in the argon ion etching effectively to transfer patterns into the underlying gold substrates. This method is flexible in controlling the shape and feature size of the patterns in the polymer resists by simply adjusting the concentration of polymer solution, and especially it also provides a route to sub-micrometer sized features by using an original template with micrometer sized features.

Key words: Polymer, Dewetting, Microcontact printing, Self-assembled monolayers, Ion etching

CLC Number:

O631

TrendMD:

LU Guang, CAO Zhao-Liang, LU Zhen-Wu, LI Wei, YAO Ji-Min, ZHANG Gang, YANG Bai, SHEN Jia-Cong . Fabrication of Patterned Polymer Resists for Ion Etching by Using Dewetting[J]. Chem. J. Chinese Universities, 2002, 23(12): 2390.

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Fabrication of Patterned Polymer Resists for Ion Etching by Using Dewetting

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