Chem. J. Chinese Universities ›› 2002, Vol. 23 ›› Issue (11): 2043.

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A Nanocrystalline NiO Thin Film Prepared by Pulsed Laser Ablation

WANG Ying1,2, QIN Qi-Zong2   

  1. 1. Research Institute of Micro/Nanometer Science and Technology, Shanghai Jiaotong University, Shanghai 200030, China;
    2. Department of Chemistry, Laser Chemistry Institute, Fudan University, Shanghai 200433, China
  • Received:2002-05-22 Online:2002-11-24 Published:2002-11-24

Abstract: The NiO thin film electrodes were prepared by reactive pulsed laser ablation of a metallic Ni target in an oxygen ambient at different temperatures. X-ray diffraction and scanning electron microscopy measurements demonstrated that the films deposited at 600 ℃ exhibited nanocrystalline structure with an average particle size of~30 nm. Electrochemical properties of NiO films were examined by charge-discharge measurements. Excellent electrochemical performance, a high capacity retention compared to the amorphous NiO, could be achieved with nanocrystalline NiO films. The improved specific capacity, discharge rate and cycling performance might be related to nano-sized character of the thin film electrode of NiO. This NiO thin film could be used as a promising electrode material for all-solid-state thin film rechargeable Li-ion batteries.

Key words: Pulse laser ablation, NiO, Nanocrystalline, Thin film

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