Chem. J. Chinese Universities ›› 1997, Vol. 18 ›› Issue (4): 647.

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XPS Study of Static Adsorption of HPAM on SiO2

YANG Ji-Ping1, LI Hui-Sheng1, HUANG Peng-Cheng2   

  1. 1. College of Chemical Engineering and Material Science, Beijing Institute of Technology, Beijing, 100081;
    2. Department of Material Science and Engineering, Beijing University of Aeronatics and Astronautics, Beijing, 100083
  • Received:1996-04-17 Online:1997-05-24 Published:1997-05-24

Abstract: The relationship between the concentration of partially hydrolyzed polyacrylamide(HPAM) and the quantity of HPAMadsorbed on the SiO2 surface was studied.The X-rayphotoelectron spectroscopy(XPS) was used to investigate the interaction between the poly-mer molecules and the adsorbent surface.The experimental results show that the adsorptionof HPAMon SiO2 surface is consistent with Langmuir model.XPSanalysis of the samplessurface shows that the N/Si atomic concentration ratio reflects the quantity of HPAMad-sorbed on the SiO2 surface, and the increase of N15, binding energy is related to the formationof the hydrogen-bonding between the HPAMmolecules and the SiO2 surface.

Key words: HPAM, XPS, SiO2, Static adsorption

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