A Study of Top Layer of TiO2 Membrane Prepared by Chemical Vapor Deposition Method

Abstract

Abstract: This paper reports the growth of TiO₂ thin films deposited on porous α-Al₂O₃ce-ramic substrates by thermal chemical vapor deposition(CVD) and plasma enhanced CVDpro-cesses using TiCl₄ or Ti (OC₄H₉)₄ as the source material.The growth manner and rate of TiO₂ films as well as the structure and the surface morphology of the films are observed byXRDand SEM.And their growth mechanism is discussed.We also evaluated the gas perme-ability of the ceramic membranes modified with TiO₂, top layer by CVDrnethods.

Key words: Titanium oxide, Ceramic membrane, Chemical vapor deposition, Permeability

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PENG Ding-Kun, YANG Ping-Hua, LIU Zi-Tao, MENG Guang-Yao. A Study of Top Layer of TiO₂ Membrane Prepared by Chemical Vapor Deposition Method[J]. Chem. J. Chinese Universities, 1997, 18(4): 499.

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A Study of Top Layer of TiO₂ Membrane Prepared by Chemical Vapor Deposition Method

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