Chem. J. Chinese Universities ›› 1993, Vol. 14 ›› Issue (7): 935.

• Articles • Previous Articles     Next Articles

Studies on Deposition of Cobalt Thin Film by Surface Wave Excitation Microwave Plasma Dissociation of Co(CH3COO)2

YU Ai-Min, LI Quan-Zhong, JIN Qin-Han   

  1. Department of Chemistry, Mia University, Changchun, 130023
  • Received:1993-02-24 Revised:1993-05-22 Online:1993-07-24 Published:1993-07-24

Abstract: Using a low-powered microwave generator and a Surfatron discharge cavity, cobalt filmswere synthesized on silica glass substrates from hydrogenolysis of Co(CH3COO)2 by Ar microwave plasma surface wave excitation.In addition, the chemical behavior of atomic hydrogen on the formation of cobalt film was studied and discussed.

Key words: Surface wave excitation, Microwave plasma, Cobalt film

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