高等学校化学学报

高等学校化学学报 ›› 1999, Vol. 20 ›› Issue (1): 111.

• 论文 • 上一篇    下一篇

氯参与的化学气相淀积金刚石的热力学分析

刘志杰1, 张卫1, 张剑云1, 万永中1, 王季陶1, 曹传宝2, 朱鹤孙2   

  1. 1. 复旦大学电子工程系CVD研究室, 上海 200433;
    2. 北京理工大学材料科学研究室, 北京 100081
  • 收稿日期:1998-01-15 出版日期:1999-01-24 发布日期:1999-01-24
  • 基金资助:

    国家自然科学基金;“八六三”高科技基金

Thermodynamic Analysis for Chemical Vapor Deposition Diamond with the Participation of Chlorine

LIU Zhi-Jie1, ZHANG Wei1, ZHANG Jian-Yun1, WAN Yong-Zhong1, WANG Ji-Tao1, CAO Chuan-Bao2, ZHU He-Sun2   

  1. 1. Department of Electronic Engineering, CVD Laboratory, Fudan University, Shanghai, 200433;
    2. Material Science Laboratory, Beijing University of Science and Technology, Beijing, 100081
  • Received:1998-01-15 Online:1999-01-24 Published:1999-01-24

PDF (PC)

被引次数

3

摘要： 用非平衡热力学耦合模型研究了金刚石在CHCl体系中的生长,计算所得CHCl体系的金刚石生长的相图与大量实验结果符合良好.通过热力学分析讨论了氯的添加对提高金刚石薄膜生长速率及其质量的影响以及降低淀积温度的作用.

关键词: 氯, 金刚石, 化学气相淀积, 热力学

Abstract: Diamond growth condition for C2H2Cl system is studied by using The non-equilibrium Thermodynamic coupling model.The pHase diagram for diamond growt h is calculated, which is in good agreement with many reported experiments.The experimental observation that diamond film may grow at a higher rate under low temperature and have better qualities due to The addition of chlorine is also discussed according to The Thermodynamic analysis.

Key words: Chlorine, Diamond, Chemical vapor deposition, Thermodynamics

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