高等学校化学学报

高等学校化学学报 ›› 1990, Vol. 11 ›› Issue (10): 1129.

• 研究简报 • 上一篇    下一篇

氩氧控制气氛下直流电弧放电中氟化反应

胡斌, 江祖成, 廖振环, 曾云鹗   

  1. 武汉大学化学系
  • 收稿日期:1989-01-28 出版日期:1990-10-24 发布日期:1990-10-24
  • 通讯作者: 胡斌, 邮编: 430072

Fluorination Reaction Under Ar-O2 Controlled Atmosphere DC Arc Discharge

Hu Bin, Jiang Zucheng, Liao Zhenhuan, Zeng Yun'e   

  1. Department of Chemistry, Wuhan Unviersity, Wuhan
  • Received:1989-01-28 Online:1990-10-24 Published:1990-10-24

PDF (PC)

被引次数

4

摘要： 本文以前文[1]为基础测定了不同氟化剂存在下杂质元素的蒸发率,计算了弧温、电子密度以及杂质元素的电离度,研究了影响元素谱线强度的诸因素,用晶体X射线衍射分析了电极反应残留物,提出了氟化反应的机理,并通过热力学计算予以说明。

关键词: 直流电弧放电, 控制气氛, 氯化反应

Abstract: Evaporization rate of impurity elements was determined in the presence of different fluorat-ing agents. Arc temperature, electron pressure, ionization degree of impurity elements were calculated. On the basis of these data, all kinds of factors influencing the element spectral intensity are discussed. Reaction products in the electrode cavity were analysed with X-ray diffraction. Under these conditions the mechanism of the fluorination reaction is proposed, and demonstrated by thermodynami-cal calculation.

Key words: Direct current arc discharge, Controlled atmosphere, Fluorination reaction

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