Research on Preparation and Properties of CNx Thin Films with High Nitrogen Content by Electrodeposition in Liquid Phase

Abstract

Abstract: CN_x thin films with a high nitrogen content were prepared on ITO conductive glass substrates by cathode electrodeposition, using dicyandiamide(C₂H₄N₄) in acetone as the precursors. The surface morphologies of CN_x thin films were observed by thermal field emission scanning electron microscopy(SEM). The size of CN_x got a nanometer level, with about 80 nm minimum size. The N/C atomic ratio and bond state in the films were studied by X-ray photoelectron spectroscopy(XPS). The maximum value of the N/C atomic ratio was 1.08. Carbon and nitrogen existed mainly in the form of C-N bond, with little CN bond. Fourier transform infrared(FTIR) spectroscopy supports the existence of C-N covalent bond. Through the UV-Vis absorption phenomenon, the ultraviolet radiation(200-280 nm) could be transmitted. The electrical resistivities of the films were in the range of 10¹²-10¹⁶ Ω·cm.

Key words: CN_x, Electrodeposition, Cathode, Conductive glass, Dicyandiamide

CLC Number:

O614

TrendMD:

ZHANG Jia-Tao, CAO Chuan-Bao, Qiang, LI Chao, ZHU He-Sun . Research on Preparation and Properties of CN_x Thin Films with High Nitrogen Content by Electrodeposition in Liquid Phase[J]. Chem. J. Chinese Universities, 2003, 24(7): 1251.

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Research on Preparation and Properties of CN_x Thin Films with High Nitrogen Content by Electrodeposition in Liquid Phase

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