Chem. J. Chinese Universities ›› 2023, Vol. 44 ›› Issue (1): 20220656.doi: 10.7503/cjcu20220656
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Received:
2022-10-06
Online:
2023-01-10
Published:
2022-11-27
Contact:
YIN Yadong
E-mail:yadong.yin@ucr.edu
Supported by:
CLC Number:
TrendMD:
YE Zuyang, YIN Yadong. Etching-based Hollowing of Nanostructures[J]. Chem. J. Chinese Universities, 2023, 44(1): 20220656.
Method | Formation of protective shell | Requirement for dedicated coating steps | Shell resistance to etching | Shell composition | Control over shell thickness |
---|---|---|---|---|---|
Hard templating | Precoating | Yes | High | Same as the coating | By coating |
Redox⁃assisted etching | During etching | No | High | Reaction dependent | By etchant amount |
Surface⁃passivated etching | Precoating | No | Medium | Original composition | By etching time |
Table 1 Summary of etching-based hollowing methods
Method | Formation of protective shell | Requirement for dedicated coating steps | Shell resistance to etching | Shell composition | Control over shell thickness |
---|---|---|---|---|---|
Hard templating | Precoating | Yes | High | Same as the coating | By coating |
Redox⁃assisted etching | During etching | No | High | Reaction dependent | By etchant amount |
Surface⁃passivated etching | Precoating | No | Medium | Original composition | By etching time |
Fig.1 Schematic illustration showing the typical synthesis procedure of the hard templating method(A) and TEM images of the samples at each preparation step(B—D)[19](B) SiO2@TiO2 core⁃shell structures prepared by sol⁃gel coating; (C) SiO2@TiO2 core⁃shell structures after water⁃assisted crystallization; (D) mesoporous TiO2 hollow nanostructures after removing SiO2 cores.(B)—(D) Copyright 2013, the Royal Society of Chemistry.
Fig.2 TEM images of anisotropic hollow nanostructures prepared using the hard templating method[31](A) FeOOH nanorods; (B) FeOOH/Au@RF hybrid rods; (C) Au nanoparticle-decorated RF nanocapsules.
Fig.5 Synthesis of hollow Pd nanocrystals with thin walls by repeating the cavitation process three times[45](A) Schematic illustration showing the evolution of the molar ratio of P to Pd during repeated cavitation cycles; (B—G) high-angle annular dark-field scanning TEM(HAADF-STEM) images(B—D) and high-resolution HAADF-STEM images(E—G) of the obtained hollow nanocrystals after repeated cavitation cycles: H-Pd-1 obtained by one cavitation cycle(B, E), H-Pd-2 achieved by two cavitation cycles(C, F), and H-Pd-3 produced by three cavitation cycles(D, G). Scale bars in (B)—(D) are 50 nm. Scale bars in (E)—(G) are 5 nm.
Fig.6 Hollow SiO2 nanostructures prepared based on the surface⁃protected etching method[53](A)—(D) TEM images of silica nanospheres after being etched in 0.33 mol/L NaOH for 5 h. Before etching, the silica nanospheres were heated at 100 ℃ for 3 h in a PVP solution with different molar ratios of PVP repeating unit to Si: 0(A), 1(B), 5(C), and 10(D). The scale bars are 100 nm. (E) Change of dissolved SiO2 concentration as a function of etching time. The error of each value was calculated by taking the standard deviation of three measurements.
Fig.8 Pd octahedral nanoframes prepared by maneuvering the rates of oxidative etching and regrowth[62](A) Representative TEM image; (B) HAADF⁃STEM images; (C) HRTEM images of Pd octahedral nanoframe projected along (110), (100), and (111) zone axes and the corresponding Fourier transform(FT) patterns, respectively; (D) 3D model of a Pd octahedral nanoframe and its projections along (110), (100), and (111) zone axes.
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