Crystalline Carbon Nitride Deposited by Glow Discharge in Liquid Phase

Abstract

Abstract: A new electrodeposition system, with a thin nickel wire as the anode, was used to deposit the CN x thin film on Si(100) substrate from a dicyandiamide-saturated solution in acetonitrile at a high potential. During the experiment, when a certain high potential was applied, spark occurred between the Ni wire anode and the Si(100) substrate. The films were characterized by X-ray photoelectron spectroscopy(XPS), Fourier-transform infrared spectroscopy(FTIR), scaning electron microscopy(SEM) and X-ray diffraction(XRD). It was indicated that multiphase of α-C₃N₄, β-C₃N₄ and g-C₃N₄ was obtained in the films. This work is the first attempt to deposit carbon nitride material through a thin nickel wire anode and might provide a new route for preparing pure crystalline C₃N₄.

Key words: Carbon nitride, Thin film, Electrodeposition, Thin nickel wire anode

CLC Number:

O484

TrendMD:

LI Chao, CAO Chuan-Bao, ZHU He-Sun, Lü Qiang, ZHANG Jia-Tao, XIANG Xu . Crystalline Carbon Nitride Deposited by Glow Discharge in Liquid Phase[J]. Chem. J. Chinese Universities, 2004, 25(1): 21.

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Crystalline Carbon Nitride Deposited by Glow Discharge in Liquid Phase

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