Chem. J. Chinese Universities ›› 1994, Vol. 15 ›› Issue (11): 1666.

• Articles • Previous Articles     Next Articles

Studies on the Existence and Stability of Hexagonal Structure Nickel in Electrodeposited Ni

GE Fu-Yun1, YAO Shi-Bing2, XU Shu-Kai2, ZHOU Shao-Min2   

  1. 1. Center of Analysis and Testing, Xiamen University, Xiamen;
    2. Department of Chemistry, Xiamen University, Xiamen, 361005
  • Received:1993-11-04 Revised:1994-06-11 Online:1994-11-24 Published:1994-11-24

Abstract: Sulfur-containing Ni and sulfur-free Ni deposits have been studied by means of transmission electron microscopy and selected area electron diffraction.The results showed that sulfur-free Ni deposit is of grainy structure, the grain size is about l00-500 nm and the structure is FCC, and sulfur-containing Ni deposit is of laminated structure, the layer thickness is about 200-300 nm, the gain size is about 20-30 nm. Besides FCC Ni, a hexagonal structure Ni is also found between the layers in the sulfur-containing Ni deposit.The differential scanning calorimetry experiment of the Ni deposits showed that the hexagonal structure Ni would be transfered into more stable FCC Ni at near l80℃.

Key words: Hexagonal structure Ni, Electrodeposited Ni, TEM, DSC

TrendMD: