Abstract:

A new chelating resin was prepared by grafting poly(glycidyl methacrylate)(PGMA) onto the chloromethylated polystyrene beads via surface-initiated atom transfer radical polymerization(SI-ATRP), and followed by the reaction of epoxy groups in the grafted PGMA with iminodiacetic acid(IDA). The structure of chelating resin was characterized using Fourier transform infrared spectroscopy, elemental analysis, surface \{area and porosity analyzer. An increase in the polymerization time leads to the increases in GMA grafting \{yield, IDA binding amount and adsorption capacities of Ni(Ⅱ), Cu(Ⅱ) and Pb(Ⅱ). When the polymerization time was 18 h, the maximum sorption capacities of Ni(Ⅱ), Cu(Ⅱ) and Pb(Ⅱ) were 1.29, 1.19 and 0.83 mmol/g, respectively, which were higher than those on the same type of the reported absorbent. The results indicated ATRP is a feasible method to prepare chelating resin with higher and controlled adsorption \{capacity.

Key words: Chloromethylated polystyrene bead, Surface-initiated atom transfer radical polymerization, Iminodiacetic acid, Heavy metal ion, Adsorption capacity