一种可以正负互用的水型化学增幅抗蚀剂的研究

高等学校化学学报 ›› 2000, Vol. 21 ›› Issue (9): 1485.

一种可以正负互用的水型化学增幅抗蚀剂的研究

陈明¹, 李元昌¹, 洪啸吟¹, 焦晓明², 程爱萍²

1. 清华大学化学系, 北京 100084;
2. 北京化学试剂所, 北京 100022

收稿日期:1999-07-15 出版日期:2000-09-24 发布日期:2000-09-24
通讯作者: 洪啸吟(1938年出生),男,教授,主要从事功能高分子材料研究.
基金资助:
国家自然科学基金(批准号:59633110;59773007)资助

Image Reversal Techniques with a Water-based Chemical Amplified Photoresist

CHEN Ming¹, LI Yuan-Chang¹, HONG Xiao-Yin¹, JIAO Xiao-Ming², CHENG Ai-Ping²

1. Department of Chemisty, Tsinghua University, Beijing 100084, China;
2. Beijing Institute of Chemical Reagent, Beijing 100022, China

Received:1999-07-15 Online:2000-09-24 Published:2000-09-24

摘要/Abstract

摘要： 研究了一种由甲酚醛树脂、六甲氧基甲基三聚氰胺(HMMM)、六氟磷酸根二苯碘盐和光敏剂组成的水型紫外化学增幅抗蚀剂,发现二苯基碘盐不仅可以作为光敏产酸物,而且可以作为阻溶剂.用碘盐作为光敏产酸物,光解产生的酸可以在中烘时催化甲酚醛树脂与HMMM的交联反应;用氢氧化钠-乙醇水溶液显影可以得到负性光刻图形;采用碘盐作为阻溶剂,可阻止非曝光区的胶膜溶解在显影液中,用稀的氢氧化钠水溶液显影可以得到正性光刻图形.通过优化后的光刻工艺条件,采用不同的显影液和光刻工艺流程,实现了同一光致抗蚀剂的正负性反转,并分别得到负性和正性光刻图形.

关键词: 化学增幅, 光敏产酸物, 阻溶剂, 负性光致抗蚀剂, 正性光致抗蚀剂

Abstract: Awater-based chemical amplified photoresist, which is composed of Novolak resin, hexamethoxylmethyl melamine(HMMM), diphenyliodonium salt and photosensitizer was investigated. It was found that the diphenyliodonium salt can act not only as the photosensitive acid generator, but also as the dissolution inhibitor. As a photosensitive acid generator, the diphenyliodonium salt can generate acid after exposure, which catalyzes the condensation of Novolac-HMMMsystem in post-exposure bake step. Using the alkali-ethanol aqueous solution as the developer the photoresist can be of negative tone. As a dissolution inhibitor, the diphenyliodonium salt can prevent the unexposure film from being dissolved in the developer. Therefore, using the dilute alkali aqueous solution as developer this photoresist can be of positive tone. Image reversal can be achieved by selecting different developer and different photographic process. The negative tone image and the positive tone image were obtained by the optimized photolithographic parameters.

Key words: Chemical amplified, Photosensitive acid generator, Dissolution inhibitor, Negative photoresist, Positive photoresist

中图分类号:

O631

TrendMD:

陈明, 李元昌, 洪啸吟, 焦晓明, 程爱萍. 一种可以正负互用的水型化学增幅抗蚀剂的研究. 高等学校化学学报, 2000, 21(9): 1485.

CHEN Ming, LI Yuan-Chang, HONG Xiao-Yin, JIAO Xiao-Ming, CHENG Ai-Ping. Image Reversal Techniques with a Water-based Chemical Amplified Photoresist. Chem. J. Chinese Universities, 2000, 21(9): 1485.