高等学校化学学报

高等学校化学学报 ›› 1997, Vol. 18 ›› Issue (4): 647.

• 论文 • 上一篇    下一篇

XPS分析部分水解聚丙烯酰胺在石英砂上的静态吸附行为

杨继萍1, 李惠生1, 黄鹏程2   

  1. 1. 北京理工大学化学化工与材料学院, 北京, 100081;
    2. 北京航空航天大学材料科学与工程系, 北京, 100083
  • 收稿日期:1996-04-17 出版日期:1997-05-24 发布日期:1997-05-24
  • 通讯作者: 黄鹏程.
  • 作者简介:杨继萍. 女, 29岁, 博士研究生.

XPS Study of Static Adsorption of HPAM on SiO2

YANG Ji-Ping1, LI Hui-Sheng1, HUANG Peng-Cheng2   

  1. 1. College of Chemical Engineering and Material Science, Beijing Institute of Technology, Beijing, 100081;
    2. Department of Material Science and Engineering, Beijing University of Aeronatics and Astronautics, Beijing, 100083
  • Received:1996-04-17 Online:1997-05-24 Published:1997-05-24

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被引次数

19

摘要： 研究了部分水解聚丙烯酰胺(HPAM)在石英砂表面的吸附量与HPAM浓度的关系.结果表明,HPAM在石英砂上的吸附基本符合Langmuir吸附模式,并且是不完全可逆吸附.XPS分析表明,N/Si原子比基本反映了HPAM在石英砂表面上的吸附量,N1结合能的升高反映了HPAM和石英砂表面间的氢键作用.

关键词: 部分水解聚丙烯酰胺, X射线光电子能谱(XPS), 石英砂, 静态吸附

Abstract: The relationship between the concentration of partially hydrolyzed polyacrylamide(HPAM) and the quantity of HPAMadsorbed on the SiO2 surface was studied.The X-rayphotoelectron spectroscopy(XPS) was used to investigate the interaction between the poly-mer molecules and the adsorbent surface.The experimental results show that the adsorptionof HPAMon SiO2 surface is consistent with Langmuir model.XPSanalysis of the samplessurface shows that the N/Si atomic concentration ratio reflects the quantity of HPAMad-sorbed on the SiO2 surface, and the increase of N15, binding energy is related to the formationof the hydrogen-bonding between the HPAMmolecules and the SiO2 surface.

Key words: HPAM, XPS, SiO2, Static adsorption

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