高等学校化学学报

高等学校化学学报 ›› 1994, Vol. 15 ›› Issue (11): 1666.

• 论文 • 上一篇    下一篇

镍镀层中微量六方晶格镍的存在与稳定性研究

葛福云1, 姚士冰2, 许书楷2, 周绍民2   

  1. 1. 厦门大学分析测试中心;
    2. 厦门大学化学系, 厦门, 361005
  • 收稿日期:1993-11-04 修回日期:1994-06-11 出版日期:1994-11-24 发布日期:1994-11-24
  • 通讯作者: 周绍民.
  • 作者简介:葛福云,男,30岁,博士,讲师.
  • 基金资助:

    国家自然科学基金

Studies on the Existence and Stability of Hexagonal Structure Nickel in Electrodeposited Ni

GE Fu-Yun1, YAO Shi-Bing2, XU Shu-Kai2, ZHOU Shao-Min2   

  1. 1. Center of Analysis and Testing, Xiamen University, Xiamen;
    2. Department of Chemistry, Xiamen University, Xiamen, 361005
  • Received:1993-11-04 Revised:1994-06-11 Online:1994-11-24 Published:1994-11-24

PDF (PC)

被引次数

6

摘要： 对由含糖精的Watts液得到的镍镀层(含硫镍)和Watts镍镀层(无硫镍)进行透射电镜观察及选区电子衍射实验,结果表明无硫镍镀层呈粒状结构,晶粒尺寸在100～500nm之间,属面心立方结构；含硫镍镀层为层状结构,层间距在700～1500nm之间,每层又由许多宽约200～300nm的小层组成,晶粒尺寸约20～30nm,大部分属面心立方结构,在层与层交界处发现有少量六方结构镍晶体,差示扫描量热法实验表明,在约180℃左右六方结构镍转化为更稳定的面心立方结构。

关键词: 六方晶格镍, 电沉积镍, TEM, DSC

Abstract: Sulfur-containing Ni and sulfur-free Ni deposits have been studied by means of transmission electron microscopy and selected area electron diffraction.The results showed that sulfur-free Ni deposit is of grainy structure, the grain size is about l00-500 nm and the structure is FCC, and sulfur-containing Ni deposit is of laminated structure, the layer thickness is about 200-300 nm, the gain size is about 20-30 nm. Besides FCC Ni, a hexagonal structure Ni is also found between the layers in the sulfur-containing Ni deposit.The differential scanning calorimetry experiment of the Ni deposits showed that the hexagonal structure Ni would be transfered into more stable FCC Ni at near l80℃.

Key words: Hexagonal structure Ni, Electrodeposited Ni, TEM, DSC

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