高等学校化学学报 ›› 1991, Vol. 12 ›› Issue (7): 954.

• 论文 • 上一篇    下一篇

彩虹色铬膜电沉积研究

葛福云, 许书楷, 周绍民   

  1. 厦门大学化学系, 厦门, 361005
  • 收稿日期:1990-04-29 出版日期:1991-07-24 发布日期:1991-07-24
  • 通讯作者: 葛福云
  • 基金资助:

    福建省自然科学基金

Studies on Iridescent Chromium Films Electrodeposition

Ge Fu-yun, Xu Shu-kai, Zhou Shao-min   

  1. Department of Chemistry, Xiamen University, Xiamen, 361005
  • Received:1990-04-29 Online:1991-07-24 Published:1991-07-24

摘要: 本文对电沉积铬形成的彩虹色铬膜进行了XPS、UPS分析,并用电化学方法研究其形成过程,根据彩虹色铬膜的成分分布。该膜可分为表面层、中间层和与基底连接的交界层,对彩虹色铬膜的形成机理和显色原因也进行了探讨。

关键词: 彩虹色铬膜, CrO3, 阴极膜, XPS, UPS

Abstract: Iridescent chromium films prepared by cathode electrodeposition on Ni substrate are studied by XPS and UPS. The mechanism of the film formation is also studied by electrochemical method. The results show that the films consist of three layers: (1) Surface layer, about 30 nm thick, containing Cr(Ⅵ) and Cr(Ⅲ)[Cr(OH)3, CrOOH and Cr2O3], which were formed by adsorption of chemical compounds near the elecctrode; (2) Intermediate layer, about 200 nm thick, mainly composed of Cr2O3produced by electroreduction of CrO3; (3) Interfacial layer connected with the substrate, about 150 nm thick, comprised of Cr2O3, Cr and Ni. The third was formed by reduction of the oxide films on the electrode. The colour of the films arises from the absorption of light of the unpaired 3d electrons under the influence of O2-distorted octahedral iigand field and from the light interference in the thin films.

Key words: Iridescent chromium films, CrO3, Cathode films, XPS, UPS

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