吸附溶出伏安法研究(Ⅰ)—铜(Ⅱ)存在下痕量半胱氨酸的测定

高等学校化学学报 ›› 1986, Vol. 7 ›› Issue (9): 786.

吸附溶出伏安法研究(Ⅰ)—铜(Ⅱ)存在下痕量半胱氨酸的测定

孙长林, 胡伟, 邵君波, 朱亚尔

浙江工学院化工系

收稿日期:1985-06-05 出版日期:1986-09-24 发布日期:1986-09-24

Study on Adsorptive Stripping Voltammetry (Ⅰ)—Determination of Trace Cysteine in the Presence of Copper(Ⅱ)

Sun Changlin, Hu Wei, Shao Junbo, Zhu Yaer

Department of Chemical Engineering, Zhejiang Institute of Technology, Hangzhou

Received:1985-06-05 Online:1986-09-24 Published:1986-09-24

摘要/Abstract

摘要： 吸附溶出伏安法是近年发展起来的一种新的电分析方法。Kalvoda^[1.2]等对其机理及应用作了报导,孙长林等研究了铜(Ⅱ)存在下痕量半胱氨酸(RSH)的阴极溶出行为,认为所得溶出峰为吸附溶出峰。本文对其机理作了进一步探讨,证实了其电积过程为吸附过程。并用拟定的方法,无需前处理,测定了人血清中ppm级的RSH,结果满意。

Abstract: In this work,the adsorptive stripping behaviour of trace cysteine on mercury-film electrode in the presence of copper (I) have been studied and the mechanism is discussed.The process of electric accumulation is considered that chemical reaction is previour to the adsorption.With Britton-Robinson solution (pH3.0) as medium,a sharp sensitive peak has been observed,and the cysteine concentration over the range of 1.0×10^-10-9.0×10^-10Mis in good linear relationship with the stripping peak current values.The detection limit is as low as 5.0×10^-11M

TrendMD:

孙长林, 胡伟, 邵君波, 朱亚尔. 吸附溶出伏安法研究(Ⅰ)—铜(Ⅱ)存在下痕量半胱氨酸的测定. 高等学校化学学报, 1986, 7(9): 786.

Sun Changlin, Hu Wei, Shao Junbo, Zhu Yaer . Study on Adsorptive Stripping Voltammetry (Ⅰ)—Determination of Trace Cysteine in the Presence of Copper(Ⅱ). Chem. J. Chinese Universities, 1986, 7(9): 786.