高等学校化学学报 ›› 2019, Vol. 40 ›› Issue (9): 1818.doi: 10.7503/cjcu20190085

• 研究论文:无机化学 • 上一篇    下一篇

SIFSIX-3-Ni膜的制备及氢气分离性质

穆鑫,姜双双,张舒皓,任浩,孙福兴()   

  1. 吉林大学化学学院, 无机合成与制备化学国家重点实验室, 长春 130012
  • 收稿日期:2019-01-29 出版日期:2019-09-10 发布日期:2019-07-12
  • 通讯作者: 孙福兴 E-mail:fxsun@jlu.edu.cn
  • 基金资助:
    国家自然科学基金(批准号: )资助(21871105, 21531003);国家自然科学基金(21871105, 21531003)

Growth and Gas Permeation Properties of SIFSIX-3-Ni Membrane

MU Xin,JIANG Shuangshuang,ZHANG Shuhao,REN Hao,SUN Fuxing()   

  1. State Key Laboratory of Inorganic Synthesis and Preparative Chemistry, College of Chemistry,Jilin University, Changchun 130012, China
  • Received:2019-01-29 Online:2019-09-10 Published:2019-07-12
  • Contact: SUN Fuxing E-mail:fxsun@jlu.edu.cn
  • Supported by:
    ? Supported by the National Natural Science Foundation of China(21871105, 21531003);Supported by the National Natural Science Foundation of China(21871105, 21531003)

摘要:

利用(NH4)2SiF6修饰大孔玻璃基底后, 在溶剂热条件下制备了SIFSIX-3-Ni膜, 并研究了温度和浓度对制备SIFSIX-3-Ni膜的影响. 能谱分析(XPS)结果表明大孔玻璃表面引入了氟元素. SIFSIX-3-Ni膜的粉末X射线衍射(PXRD)峰位置和模拟结果一致, 表明成功制备出SIFSIX-3-Ni膜. 从扫描电子显微镜(SEM)照片中观察到膜连续均匀, 厚度约为20 μm. 热重分析(TGA)结果表明, 活化前的膜没有客体分子. 单组分测试结果表明, 膜的H2, CO2和N2渗透量分别为6.83×10 -6, 7.42×10 -7和8.89×10 -7 mol·m -2·s -1·Pa -1, H2/CO2和H2/N2的理想分离比分别为9.20和7.68. 在连续测试5 h后, H2, CO2和N2渗透量基本保持不变, 表明SIFSIX-3-Ni膜具有很好的稳定性.

关键词: SIFSIX-3-Ni多晶膜, 原位生长法, 氢气分离

Abstract:

Using the macroporous glass-frit disk modified by (NH4)2SiF6 as the substrate, we prepared the SIFSIX-3-Ni membrane by the in situ growth method under solvothermal conditions. The effect of temperature and concentration on the preparation of SIFSIX-3-Ni membrane were investigated in detail. X-Ray photoelectron spectroscopy(XPS) demonstrates that F atom was integrated into the substrate surface. The powder X-ray diffraction(PXRD) patterns were in accordance with the simulated one, indicating that we obtained SIFSIX-3-Ni membranes successfully. Scanning electron microscopy(SEM) showed that the SIFSIX-3-Ni-3 membrane was continuous and uniform with a thickness of about 20 μm. Thermogravimetric analysis(TGA) showed that there was no guest molecules in the membrane before activation. Single gas permeation measurement on SIFSIX-3-Ni-3 membrane demonstrated that the permeability of H2, CO2 and N2 were 6.83×10 -6, 7.42×10 -7 and 8.89×10 -7 mol·m -2·s -1·Pa -1 respectively, and the ideal selectivities of H2/CO2 and H2/N2 were 9.20 and 7.68 respectively. The membrane can retain almost the same permeance of H2, CO2 and N2 after 5 h of continuous testing, indicating that SIFSIX-3-Ni membrane have good stability.

Key words: SIFSIX-3-Ni membrane, In situ growth method, H2 separation

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