非λ/4-非λ/4 SiO2/TiO2双层增透膜的设计与制备

doi:10.7503/cjcu20170719

摘要/Abstract

摘要：

通过TFCalc膜层设计软件设计了非λ/4-非λ/4双层增透膜体系. 与λ/4-λ/4双层增透膜体系相比, 非λ/4-非λ/4双层增透膜体系中内外层薄膜的折射率仅需满足n₁≥n₂(n_s/n₀)^1/2(其中n₁、 n₂、 n_s、 n₀分别为内层膜、外层膜、基片和空气的折射率), 即可通过调节内外层薄膜的厚度实现特定波长处的100%透过, 扩展了膜层材料的选择范围. 以酸催化TiO₂薄膜和SiO₂薄膜分别作为内、外层膜层材料, 采用溶胶-凝胶浸渍-提拉法依次将TiO₂溶胶和SiO₂溶胶沉积在K9玻璃基片表面, 最终形成SiO₂/TiO₂双层增透膜. 实验结果表明, 该双层增透膜具有与TFCalc模拟透过率曲线相吻合的实测透过率曲线, 在中心波长处峰值透过率可达99.9%. 该双层增透膜经耐摩擦和黏附性测试后峰值透过率基本保持不变, 说明该增透膜具有良好的机械性能. 这种同时具备高透过率和强机械性能的增透膜在太阳能电池等领域具有较广阔的应用前景.

关键词: 膜层设计, 非λ/4-非λ/4膜系;, 双层增透膜, 高透过率, 强机械性

Abstract:

Non-quarter-wave double-layer antireflective(AR) coatings were designed with the aid of TFCalc thin film design software. Compared with quarter-wave double-layer AR coatings, non-quarter-wave double-layer AR coatings have a wider selection for film materials since the refractive index of the bottom-layer(n₁) and upper-layer(n₂) just need to satisfy the relation n₁≥n₂(n_s/n₀)^1/2(n_s and n₀ are the refractive index of substrate and air, respectively). And in the practical experiment, TiO₂ and SiO₂ sol were separately prepared by sol-gel method under acid-catalyzed condition and then consecutively deposited on K9 glass by dip-coating process to finally fabricate the mainly designed non-quarter-wave double-layer AR coating. It was found that the maximum transmittance at the reference wavelength reached 99.9%, and the measured transmittance spectrum was in accordance with the designed one from TFCalc. Futhermore, the transmittance did almost not decrease after abrasion and adhesion tests, indicating an excellent mechanical property of this SiO₂/TiO₂ AR coating. The high transmittance and excellent mechanical property give this non-quarter-wave double-layer SiO₂/TiO₂ AR coating a great potential in the field of solar cells.

Key words: Thin film design, Non-quarter-wave, Double-layer coating, High transmittance, Mechanical robust

中图分类号:

O613

TrendMD:

叶龙强, 葛新明, 张雨露, 惠贞贞, 汪徐春, 江波. 非λ/4-非λ/4 SiO₂/TiO₂双层增透膜的设计与制备. 高等学校化学学报, 2018, 39(7): 1392.

YE Longqiang, GE Xinming, ZHANG Yulu, HUI Zhenzhen, WANG Xuchun, JIANG Bo. Design and Preparation of Non-quarter-wave SiO₂/TiO₂Double-layer Antireflective Coating^†. Chem. J. Chinese Universities, 2018, 39(7): 1392.

图/表 9

Fig.1 Simulated transmission spectra of non-quarter-wave SiO2/TiO2 double-layer antireflective coating^(A) a. n1=1.77, d1=77.7 nm; b. n1=1.91, d1=72.0 nm; c. n1=1.91, d1=60.0 nm; d. n1=1.91, d1=50.0 nm;e. n1=1.91, d1=40.0 nm; f. n1=1.91, d1=30.0 nm. (B) a. n1=1.91, d1=30.0 nm; b. n1=1.91, d1=20.0 nm;c. n1=1.91, d1=10.0 nm; d. n1=1.91, d1=5.0 nm; e. n1=1.91, d1=0.

Fig.2 Simulated transmission spectra of SiO2/TiO2 double-layer antireflective coating with 100% maximum transmittance(A) and the effect of outer layer film thickness on the transmittance of SiO2/TiO2 double-layer coating(B)^(A) a. d1=24.0 nm, d2=76.0 nm; b. d1=27.0 nm, d2=85.5 nm; c. d1=30.0 nm, d2=95.5 nm; d. d1=33.0 nm, d2=104.5 nm; e. d1=36.0 nm, d2=114.0 nm; f. d1=42.0 nm, d2=133.3 nm; g. d1=48.0 nm, d2=152.0 nm. (B) a. d2=69.0 nm; b. d2=84.0 nm; c. d2=99.0 nm; d. d2=114.0 nm; e. d2=129.0 nm; f. d2=144.0 nm; g. d2=159.0 nm; h. d2=174.0 nm.

Fig.3 Simulated transmission spectra of non-quarter-wave double-layer antireflective coating with common optical film as inner layer and SiO2 film as outer layer(A) and the needed inner and outer layer film’s thicknesses to achieve 100% transmittance at 550 nm(B)^(B) Inner layer: a. Al2O3; b. Si3N4; c. Ta2O5; d. Anatase-TiO2; e. Rutile-TiO2.

Fig.4 Change in thickness of SiO2 and TiO2 film as a function of withdraw rate in dip-coating process

Fig.5 Experimental(A) and simulated(B) transmission spectra of non-quarter-wave SiO2/TiO2 double-layer coating with fixed thickness of inner layer film 36.0 nm and different thickness of outer layer film^Central wavelength and transmittance: (A) a. 395 nm, 96.0%; b. 460 nm, 98.9%; c. 497 nm, 99.5%; d. 554 nm, 99.9%; e. 591 nm, 99.8%; f. 650 nm, 99.6%; g. 692 nm, 99.4%. (B) a. 395 nm, 95.5%; b. 460 nm, 99.0%; c. 497 nm, 99.7%; d. 554 nm, 100.0%; e. 591 nm, 99.9%; f. 650 nm, 99.6%; g. 692 nm, 99.4%. Thickness of outer layer: a. 76.4 nm; b. 93.6 nm; c. 101.2 nm; d. 114.0 nm; e. 126.0 nm; f. 141.3 nm; g. 151.8 nm.

Fig.6 Dispersion curves of TiO2(a) and SiO2(b) film

Fig.7 AFM patterns of SiO2(A), TiO2(B) and SiO2/TiO2(C) coating

Fig.8 Surface(A) and cross-sectional(B) SEM images of the SiO2/TiO2 double-layer coating

Fig.9 Change in transmittance of SiO2/TiO2 double-layer antireflective coating before and after abrasion and adhesion test

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非λ/4-非λ/4 SiO₂/TiO₂双层增透膜的设计与制备

Design and Preparation of Non-quarter-wave SiO₂/TiO₂Double-layer Antireflective Coating^†

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