高等学校化学学报 ›› 2015, Vol. 36 ›› Issue (9): 1765-1770.doi: 10.7503/cjcu20150153

• 物理化学 • 上一篇    下一篇

多孔钛基掺硼金刚石电极结构对电催化降解阿司匹林性能的影响

黄卫民, 林海波()   

  1. 吉林大学化学学院, 长春 130012
  • 收稿日期:2015-02-12 出版日期:2015-09-10 发布日期:2015-08-21
  • 作者简介:联系人简介: 林海波, 男, 博士, 教授, 主要从事环境电化学和电化学工程方面的研究. E-mail:lhb910@jlu.edu.cn
  • 基金资助:
    国家自然科学基金(批准号: 21273097)、 吉林省重大科技攻关招标项目(批准号: 20130204003GX)和电分析化学国家重点实验室开放课题(2013)资助

Effect of Structure of Ti/Boron-doped Diamond Electrode on the Electrochemical Degradation Performance for Aspirin

HUANG Weimin, LIN Haibo*()   

  1. College of Chemistry, Jilin University, Changchun 130012, China
  • Received:2015-02-12 Online:2015-09-10 Published:2015-08-21
  • Contact: LIN Haibo E-mail:lhb910@jlu.edu.cn
  • Supported by:
    † Supported by the National Natural Science Foundation of China(No.21273097), the Science and Technology Development Project of Jilin Province, China(No.20130204003GX) and the Open Fund of the State Key Laboratory of Electroanalytical Chemistry, China(2013)

摘要:

利用扫描电子显微镜(SEM)和X射线衍射仪(XRD)对多孔Ti/BDD电极及传统平板Ti/BDD(BDD =钛基掺硼金刚石)电极进行了研究, 通过循环伏安法考察了电极的背景电流和电化学窗口. 以阿司匹林为模型污染物, 研究了BDD电极结构对阿司匹林电催化降解的影响. 结果表明, 多孔Ti/BDD电极的总带电量, 内、 外部带电量, 孔隙率和比表面积均高于平板Ti/BDD电极; 多孔Ti/BDD在对COD和阿司匹林的去除率和能量消耗等方面均优于平板Ti/BDD电极.

关键词: 多孔钛基体, 掺硼金刚石薄膜电极, 阿司匹林, 电催化降解

Abstract:

The surface morphology and crystal structure of three-dimensional 3D-porous titanium/boron-doped diamond(porous Ti/BDD) and planar Ti/BDD electrodes were studied by scanning electron microscopy(SEM) and X-ray diffraction(XRD). The cyclic voltammetry measurements of porous Ti/BDD and planar Ti/BDD electrodes were also performed. Porous Ti/BDD and planar Ti/BDD electrodes were used as anodes in the degradation of Aspirin, respectively. The results indicate that porous Ti/BDD has larger total, outer, and inner charges, porosity, and actual surface area due to the porous structure. Compared to planar Ti/PDD, porous Ti/BDD electrode is better on removal rate of chemical oxygen demand(COD) and Aspirin and energy consumption.

Key words: Porous titanium substrate, Boron-doped diamond film electrode, Aspirin, Electrochemical degradation

中图分类号: