Abstract:

There is a potential interest in directly connecting an organic material with Si,without the existence of interfacial oxide^[1]. To date, two different wet-chemical methods have been developed. One is the halogenation/alkylation route (radical reactions), another method is to make use of the reaction between the H-Si surface and 1-unsaturated hydrocarbon that is similar to the standard organic hydrosilylation reactions^[2]. It seems that the method of radical reactions could decrease the reaction time and reduce the material consumption. At present, the reaction mechanism involved and the surface structure are still unclear.