Chem. J. Chinese Universities

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Magnetron-Sputtered MoON Thin Film electrode for High-Performance Electrochemical Energy Storage

WAN Zhixin, YU Wei, ZHANG Minxuan, XU Ge, MAO Aiqin   

  1. Key Laboratory of Green Fabrication and Surface Technology of Advanced Metal Materials, Ministry of Education, Anhui University of Technology
  • Received:2025-08-04 Revised:2025-10-15 Online First:2025-10-17 Published:2025-10-17
  • Contact: Zhi-Xin WAN E-mail:wanzhx@ahut.edu.cn
  • Supported by:
    Supported by the Natural Science Foundation of Anhui Provincial Education Department, China(No.RZ2400002951)

Abstract: MoON thin films with gradient oxygen content were prepared by magnetron sputtering. The effects of N2/O2 partial pressures during the preparation process on the microstructure, crystallinity, chemical bonding, electrical conductivity and electrochemical performance of MoON thin film electrodes were systematically studied. Representative results revealed that when the flow rate (sccm) ratio of Ar/N2/O2 was 240/50/10, the MoON thin-film electrode exhibited the optimal performance. In a 1 M Na2SO4 solution, its capacitance per unit area increased from 134 mF·cm-2 (pure MoN thin-film electrode) to 211 mF·cm-2, with an increase of 57.5%. Moreover, it has excellent cycle stability with no capacitance retention decay after 10,000 charge and discharge cycles.

Key words: MoON film, Magnetron sputtering, Thin film electrode, Electrochemical property

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