高等学校化学学报

高等学校化学学报 ›› 2006, Vol. 27 ›› Issue (2): 233.

• 研究简报 • 上一篇    下一篇

金微盘电极的加工和表征

朱明智1,2,3, 蒋庄德1,2, 景蔚萱1,2   

  1. 1. 机械制造系统工程国家重点实验室, 2. 西安交通大学精密工程研究所, 西安 710049;
    3. 中国工程物理研究院总体工程研究所, 绵阳 621900
  • 收稿日期:2005-04-14 出版日期:2006-02-10 发布日期:2006-02-10
  • 通讯作者: 蒋庄德(1955年出生), 男, 硕士, 教授, 博士生导师, 从事微机电系统与纳米技术研究. E-mail: zdjiang@mail.xjtu.edu.cn
  • 基金资助:

    国家自然科学基金(批准号: 2003CB716201, 2003CB716203)资助.

Fabrication and Characterization of Au Disk Mircoelectrodes

ZHU Ming-Zhi 1,2,3， JIANG Zhuang-De 1,2, JING Wei-Xuan 1,2   

  1. 1. State Key Laboratory for Manufacturing Systems Engineering,
    2. Institute of Precision Engineering, Xi′an Jiaotong University, Xi′an 710049, China;
    3. Institute of Structural Mechanics, China Academy of Engineering Physics, Mianyang 621900, China
  • Received:2005-04-14 Online:2006-02-10 Published:2006-02-10
  • Contact: JIANG Zhuang-De,E-mail: zdjiang@mail.xjtu.edu.cn

PDF (PC)

被引次数

2

摘要：

微电极具有常规电极无法比拟的优良的电化学特性[1,2].它包括单微电极和微电极阵列, 其中单微电极的整体尺寸小, 可用于微区分析研究. 目前微盘电极的工艺改善目标主要包括: 电极整体尺寸小、 电极材料和绝缘层之间的粘附性高及电极具有明确的和可重复的形状和尺寸等[3]方面.

关键词: 关键词金微盘电极; 等离子增强化学气相沉积; 氮化硅; 循环伏安法; 扫描电子显微镜

Abstract:

AbstractAu fiber disk microelectrodes with well defined geometries were fabricated by low temperature  plasma enhanced chemical vapor deposition(PECVD). Silicon nitride thin films with thickness of 0.7 μm were deposited concentrically on the cylindrical length of 25 μm Au fibers. To form microelectrodes devices, the coated gold microfibre was connected to a copper leader with Ag epoxy. The thin film deposition was performed in a PECVD instrument with substrate temperature (340±10) ℃. Comparing with chemical vapor deposition and resistive heating (CVD\|RH), the insulation by the PECVD can be performed to metal microfibres with the low melting or softening points for the fabrication of microelectrodes as it offers the possibility to fabricate a surface coating at low temperature (≤450 ℃). The quality, thickness and adhesion to the fiber substrates of films were characterized by scanning electron microscopy. The films are found to be free of microcracks and have a quality seal with Au fibers. Cyclic voltammograms were obtained in electrolyte of 0.5 mmol/L K3Fe3 (CN)6 in 0.5 mol/L KCl solution. The electrochemical responses are sigmoidal in shape and indicate that the radial diffusion is the primary mode of mass transport at different scan rates. As a result, the silicon nitride coated disk microelectrodes exhibit an excellent microelectrode electrochemical response without  using an epoxy sealant.

Key words: KeywordsAu disk microelectrodes; Plasma enhanced chemical vapor deposition; Silicon nitride; Cyclic voltammetry; Scanning electron microscopy

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