薄层电解池流动注射法测定铜

高等学校化学学报 ›› 1989, Vol. 10 ›› Issue (5): 554.

薄层电解池流动注射法测定铜

朱元保, 黄杉生, 龙有前, 刘慧言, 曾丽荪

湖南大学

收稿日期:1987-09-28 出版日期:1989-05-24 发布日期:1989-05-24
通讯作者: 朱元保

Thin-Layer Electrolytic Cell Determination of Copper by Flow Injection Method

Zhu Yuanbao, Huang Shaosheng, Long Youqian, Liu Huiyan, Zeng Lisun

Hunan University, Changsha

Received:1987-09-28 Online:1989-05-24 Published:1989-05-24

摘要/Abstract

摘要： 薄层电解池做高压液相色谱鉴定器的报道较多。但不用分离装置的简单薄层电解池流动注射法国内似尚未见正式报道,国外报道也很少。Alexandra^[1]等曾以管状金电极流动注射安培法测定氯。我们分别以大面积银、铜、玻璃碳、铜面镀金为工作电极装配电解池,试验发现以玻璃碳为最佳。本文报道薄层电解池的结构及用薄层电解池流动注射法测定铜的试验条件及结果。

关键词: 薄层电解池, 铜的测定, 流动注射法

Abstract: The construction and characteristics of a thin-layer electrolytic cell with graphite glass as working electrode are presented. In the medium of NH₄Cl-NH₃H₂O, the peak current is proportional to the concentration of copper from 10^-6mol/Lto 10^-2 mol/L(1 .27 ×10^-5～1.27 ×10^-9 g Cu) at a voltage of -0.30V. The correlation coefficient is 0.99. During the determinationt the charging current and poison of mercury do not exist, and oxygen must in the solution must not be removed. The method has been applied to determination of copper in aluminium alloy and in the steel.

Key words: Thin-layer electrolytic cell, Determination of copper, Flow injection method

TrendMD:

朱元保, 黄杉生, 龙有前, 刘慧言, 曾丽荪. 薄层电解池流动注射法测定铜. 高等学校化学学报, 1989, 10(5): 554.

Zhu Yuanbao, Huang Shaosheng, Long Youqian, Liu Huiyan, Zeng Lisun . Thin-Layer Electrolytic Cell Determination of Copper by Flow Injection Method. Chem. J. Chinese Universities, 1989, 10(5): 554.

[1]	段忆翔, 鲁慧, 候明轶, 张寒琦, 金钦汉. 微波等离子体原子吸收光谱法测定铜的研究[J]. 高等学校化学学报, 1992, 13(10): 1241.
[2]	许宏鼎, 刘再新, 王明慧. 铜铁试剂的交流示波极谱滴定法研究[J]. 高等学校化学学报, 1990, 11(6): 583.
[3]	张正奇, 俞汝勤. 铜(Ⅱ)-2-QADNm络合物电分析性能研究[J]. 高等学校化学学报, 1988, 9(12): 1227.